Size Effect in Ferroelectric Thin Films Prepared by Atomic Layr Controlled Growth
Size Effect in Ferroelectric Thin Films Prepared by Atomic Layr Controlled Growth
批准号:
07650367
负责人:
ISHIKAWA Kenji
金额:
$1.28万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996
中文摘要
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英文摘要
The dielectric properties, such as the Curie temperature, dielectric constant, coercive field and others, depend on the film thickness or the diameter of the constituent crystallites when the size reduces to sub-micron order. The purpose of this study is to clarify the origin of the size effects. Thin films of several tens to several hundreds nanometer in thickness of lead titanate and PZT were grown on silicon substrates by means of laser ablation and sol-gel technique. A platinum-coated silicon was mainly used as a substrate. Pellets of BaTiO_3 (BT), PbTiO_3 and PZT ceramics were used as the target material of the laser ablation growth.The surface of the film was investigated by a scanning electron microscope and an atomic force microscope and found to be flat with nanometer scale. The Curie temperature of very thin BT film was slightly higher than that of bulk crystal. This tendency was opposite to our expectation, the Curie temperature would shift towards low temperatures. The results show that the inner stress plays an important role in size effects. Thin films of PT grown by laser ablation was investigated by X-ray diffraction and found to be well crystallized. Film of PZT was grown on the PT layr by a sol-gel method. The film showed a large peak around 350゚C, very close to the Curie temperature of bulk PZT.This means the presence of PT layr is effective to proceed the crystallization of PZT film layr.Experiments on the atomic layr growth was performed in a compound semiconductor system since it was difficult to make layr by layr growth of dielectric crystals.
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A. H. Jayatissa: "Growth of Highly Oriented Silicon Films on Si (100) and Al_2O_3 by Cathode-type rf Glow Discharge Method" Special Issue of Bulletin of the Research Institute of Electronics, Shizuoka University. 30. 127-130 (1995)
A. H. Jayatissa:《Growth of Height Oriented Silicon Films on Si (100) and Al_2O_3 by Cathode type rf Glow Discharge Method》静冈大学电子研究所通报特刊。
DOI:
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影响因子:
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作者:
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通讯作者:
M.Yoshikawa: ""Surface Stoichiometry and Reconstruction of GaP (001)"" Extended Abstract of SSDM. 728-730 (1995)
M.Yoshikawa:“GaP (001) 的表面化学计量和重建”SSDM 的扩展摘要。
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通讯作者:
Masahiro Yoshikawa: "Surface Stoichiometry and Reconstruction of GaP (001)" Extended Abstract of Int.Conf.S.S.D.M.728-730 (1995)
Masahiro Yoshikawa:“GaP 的表面化学计量和重建 (001)”Int.Conf.S.S.D.M.728-730 的扩展摘要 (1995)
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
Masahiro Yoshikawa: "Surface Stoichiometry and Reconstruction of GaP (001)" Extended Abstract of Int. Conf. S. S. D. M.728-730 (1995)
Masahiro Yoshikawa:“GaP (001) 的表面化学计量和重建”Int. 的扩展摘要。
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作者:
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通讯作者:
M.Yoshikawa: ""Surface Reconstruction of GaP (001) for Various Surface Stoichiometries"" Jpn.J.Appl.Phys.35-2B. 1205-1208 (1996)
M.Yoshikawa:“用于各种表面化学计量的 GaP (001) 的表面重建”Jpn.J.Appl.Phys.35-2B。
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共 26 条
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