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Elementary Excitations at Semiconductor Surfaces with Controlled Adsorption

Elementary Excitations at Semiconductor Surfaces with Controlled Adsorption
具有受控吸附的半导体表面的基本激发
批准号:
09640386
负责人:
INAOKA Takeshi
金额:
$1.28万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1999

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中文摘要
翻译
随着吸附覆盖率的增加,掺杂半导体表面通常会形成载流子耗尽层或载流子累积层。在本工作的第一阶段,我们使用局域密度近似(LDA),分析了在耗尽层(D-L)形成过程中的基态和热平衡态的变化。我们发现了载流子密度分布的变化和温度效应。其次,在热平衡态计算结果的基础上,利用含时LDA方法,对D-L形成过程中表面元激发的演化进行了系统的分析。这里研究的基元激发是两个耦合的载流子等离子体激元(PL)-极性声子(PH)模式A和B和表面极性PH模式C涉及屏蔽电荷由于载流子的存在。主要研究结果如下:(1)研究了各模式的能量色散和能量损失强度的演化 关于我们 在D-L形成过程中。在模式A或B中,初始向上色散分支向下移动,并演化为弯曲色散。(2)通过研究诱导电荷密度分布中载流子和PH分量的相位关系和振幅比,阐明了D-L形成过程中PL和PH耦合特性的变化。(3)感应电荷密度分布的等值线图分析表明,在D-L形成过程中,模式A或B的空间结构发生了显著变化。在模式C下,研究了表面极性声子如何沿着表面拖曳屏蔽电荷传播,以及屏蔽电荷分布在此过程中的变化。(4)对高分辨电子能量损失谱(HREELS)的实验结果进行了解释,并对镜面反射结构下的HREELS进行了运动学分析,结果表明,在掠入射角固定、入射能量变化范围较大的情况下,我们可以扫描一个狭窄的探测色散区,以便仔细观察这种表面的色散关系,分析堆积层形成过程中表面元激发的演化已成为未来的研究课题。少
英文摘要
With increase in adsorption coverage, a carrier-depletion or carrier-accmulation layer is often formed at a doped semiconductor surface. At the first stage of the present work, using the local-density approximation (LDA), we have analyzed the variation in ground and thermal-equilibrium states in the depletion-layer (D-L) formation process. We have found the variation and the temperature effect in the carrier-density profile. Next, on the basis of the calculated result of thermal-equilibrium states and by means of the time-dependent LDA, we have made a systematic analysis of evolution of surface elementary excitations in the D-L formation process. The elementary excitations studied here are two coupled carrier plasmon (PL)-polar phonon (PH) modes A and B and the surface polar-PH mode C involving screening charges due to presence of carriers. The major results are summarized as follows :(1) We have examined the evolution of the energy dispersion and the energy-loss intensity of each mode … More in the D-L formation process. In the mode A or B, an initial upward dispersion branch shifts downward, and evolves into a warped one.(2) The variation in coupling character of PL and PH in the D-L formation process has been clarified by investigating the phase relation and the amplitude ratio of the carrier and the PH components in the induced charge-density distribution.(3) The contour-map analysis of the induced charge-density distribution has exhibited a significant variation in spatial structure of the mode A or B in the D-L formation process. In the mode C, it has shown how the surface polar phonon propagates along the surface dragging screening charges and how the screening-charge distribution varies in the process.(4) Our analysis has given a clear explanation of the experimental result of high-resolution electron energy-loss spectroscopy (HREELS).In addition, our kinematic analysis of HREELS with the specular-reflection geometry has indicated that, with a grazing incident angle fixed and with the incident energy varied in a broad range, we can scan a narrowed probing dispersion region to make a close observation of the dispersion relation of such surface-excitation modes as studied here.It has become a future problem to analyze the evolution of surface elementary excitations in an accumulation-layer formation process. Less
期刊论文(20)
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会议论文
Takeshi INAOKA: "Evolution of Electron States at Doped Semiconductor Surfaces in a Depletion-Layer Formation Process"Surface Science. 431・(1-3). 156-167 (1999)
Takeshi INAOKA:“耗尽层形成过程中掺杂半导体表面的电子状态的演化”表面科学431·(1-3)。
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通讯作者:
Takeshi INAOKA: "Elementary Excitations at Doped Polar Semiconductor Surfaces with Carrier-Depletion Layers"Applied Surface Science. 印刷中. (2000)
Takeshi INAOKA:“带有载流子耗尽层的掺杂极性半导体表面的基本激发”应用表面科学 (2000)。
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通讯作者:
Takeshi INAOKA: "Evolution of Electron States at Doped Semiconductor Surfaces in a Depletion-Layer Formation Process" Surface Science. (発表予定). (1999)
Takeshi INAOKA:“耗尽层形成过程中掺杂半导体表面的电子态演化”表面科学(即将发表)。
DOI: --
发表时间:
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作者: []
通讯作者:
Takeshi INAOKA: "Evolution of Electron States at Doped Semiconductor Surfaces in a Depletion-Layer Formation Process"Surface Science. 431. 156-167 (1999)
Takeshi INAOKA:“耗尽层形成过程中掺杂半导体表面的电子态演化”表面科学。
DOI: --
发表时间:
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通讯作者:
19
    Anisotropy of subband structure of Si and Ge surface inversion layers and control of its physical properties by means of strain
    • 批准号:
      22540332
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.75万
    • 财政年份:
      2010
    • 负责人:
      INAOKA Takeshi
    • 依托单位:
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    • 批准号:
      13640315
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $1.92万
    • 财政年份:
      2001
    • 负责人:
      INAOKA Takeshi
    • 依托单位:
    海外基金