Development of vacuum arc deposition system for fabricating AIN film available to electrical insulation film of power devices with high thermal conduction

为了制备高绝缘性、高导热、可用于电力设备的AlN薄膜，开发了一种新型的反应真空电弧沉积系统，该系统采用了屏蔽弧技术对熔滴进行过滤，这是真空电弧沉积方法中的一个致命问题。通过本研究取得了以下研究成果：1.屏蔽体系制备的薄膜几乎没有液滴，在视觉上透明，与衬底的附着力良好，而传统体系制备的薄膜由于液滴多而不透明，容易剥落。该屏蔽系统制备的薄膜折射率为2.0，在可见光和红外区的消光系数均小于10^~(-2)~(-2)，表现出超透明性。屏蔽系统沉积的薄膜比硼硅玻璃沉积的薄膜要硬得多。屏蔽系统的沉积速率是磁控溅射的1.5倍。由传统系统制备的薄膜显示出c轴取向。结果表明，屏蔽系统制备的AlN薄膜具有较高的电阻，可用于制备具有优良光学性能和机械性能的AlN薄膜。在电学和热学性质方面还需要进一步的研究。

In order to fabricate the AlN film, which exhibits high electrical insulation property with high thermal conduction and is available for of electric .power device, which is available for electric power devices, new reactive vacuum arc deposition system was developed, The system employed the shielded arc technology to filter the droplets, which has been fatal issue in vacuum arc deposition method. The following results were obtained through this research.1. The films prepared by the shielded system were almost droplet-free, transparent in visual, and adhered well to the substrate, whereas the films prepared by the conventional system were non-transparent due to many droplets and easily peeled off.2. Refractive index of the films prepared by the shielded system was 2.0 and extinction coefficient was less than 10^<-2> in visual and infrared region, showing super transparency.3. The films deposited by the shielded system were much harder than boro-silicated galss.4. Deposition rate of the shielded system was 1.5 time as high as that of Magnetron sputter.5. The films prepared by the conventional system exhibits c-axis orientation. However, the films prepared by the shielded system shows a-axis orientation, which indicates these films could have higher resistance.From above results, we concluded that the shielded reactive vacuum arc deposition system were available for fabricating AlN films with excellent optical and mechanical properties. Further investigations are required at the viewpoints of electrical and thermal properties.