Investigation for arc quenching ability of SFィイD26ィエD2 and NィイD22ィエD2 using pulse modulated induction plasma

使用脉冲调制感应等离子体研究 SF-D26D2 和 N-D22D2 的灭弧能力

• 批准号: 10450103
• 负责人: SAKUTA Tadahiro
• 金额: $ 2.94万
• 依托单位: Kanazawa University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10450103/
• 关键词: Plasma quenching ability; Inductively coupled thermal plasma; Pulse modulated mode; Transport properties; Dynamic response time; Temperature; 消弧媒体; 誘導プラズマ; 輸送特性; 立ち上がり、立ち下がり時間

On the Basis of the successive results of generating a wide area induction plasma by using MOSFET inverter with 450-kHz frequency and 50-kW power in 1998, the further experiments were carried out in the final year of the project, 1999, as follows.1) Generation of Atmospheric Induction Thermal plasma for SFィイD26ィエD2 and NィイD22ィエD2Induction plasma for SFィイD26ィエD2 gas medium which has a strong plasma quenching property was, for the first time, generated in inductively coupled mode at atmospheric pressure in this project. The power level was increased from 50 to 200kW, which gives a possibility to do the experiment for high pressure and high power condition equivalent to the actual circuit breaker interruption phenomena.2) Operation of Pulse Modulated Induction PlasmaThe most important facility to proceed this project, the pulse modulated induction thermal plasma, can be generated under several conditions with respect to the pressure(up to 0.1 Mpa), the duty factor and the shimmer current level(down to 40%). The rise and fall time of pulsing is as short as hundreds μs which gives almost ideal pulse-like disturbance to the plasma. It is found that the new facility thus developed gives a detail of dynamic decaying process of high pressure plasmas of NィイD22ィエD2, HィイD22ィエD2 and SFィイD26ィエD2 in repetitive mode.3) Measurement of SFィイD26ィエD2 and NィイD22ィエD2 Induction Plasma TemperatureThe multi-channel detection of the spectrum line from Ar-SFィイD26ィエD2 and Ar-NィイD22ィエD2 induction plasma reveals that the SF6 inclusion gives a strong shrinkage and reduction of the plasma temperature as prospected, while such effects are not enough in the case of NィイD22ィエD2 inclusion. The results showed, however, that the increase of pressure or concentration NィイD22ィエD2 gas gives a emphasis of above quenching effects almost equivalent to SFィイD26ィエD2 gas.

在1998年利用MOSFET逆变器以450 kHz频率和50 kW功率产生大面积感应等离子体的连续结果的基础上，在该项目的最后一年，1999年，进行了进一步的实验，如下所述：1）用于SF_2D_26和N_2D_22的大气感应热等离子体的产生用于SF_2D_26和N_2D_22的感应等离子体具有强等离子体淬火特性的气体介质，首次在该项目中以感应耦合方式在大气压下产生。功率水平从50 kW增加到200 kW，这使得有可能做高压和高功率条件下的实验，等效于实际断路器中断现象。2）脉冲调制感应等离子体的操作进行这个项目的最重要的设备，脉冲调制感应热等离子体，可以在几个条件下产生的压力（高达0.1 Mpa），占空因数和闪烁电流水平（低至40%）。脉冲的上升和下降时间短至几百μs，这给了等离子体几乎理想的脉冲状扰动。结果表明，该装置能较详细地描述N_（10）D_（22）N_（10）D_（22）高压等离子体的动态衰减过程，3）SF_（26）N_（22）N_N_（22）N_（2结果表明，N_（22）O

项目成果

Y. Tanaka and T. Sakuta:

Y. Tanaka 和 T. Sakuta：

T. Sakuta, Y. Tanaka, M. Katsuki and T. Ishigaki: "Generation of inductively coupled thermal plasma with pulse modulated mode"J. Japan Inst. Metals.. Vol. 63, No. 1. 2-8 (1999)

T. Sakuta、Y. Tanaka、M. Katsuki 和 T. Ishigaki：“脉冲调制模式的感应耦合热等离子体的生成”J。

T. Sakuta: "Non-equilibrium effects in pulse modulated induction thermal plasma for advanced material processing"Proc. Proc. 14ィイD1thィエD1 Int. Symp. on Plasma Chemistry. Vol. I. 14-16 (1999)

T. Sakuta：“先进材料加工中的脉冲调制感应热等离子体”Proc。14 Proc。第 I. 14-16 卷。

田中,作田: "化学非平衡モデルによる誘導SF_6熱プラズマの過渡解析" 電気学会 放電研究会資料. 1. 29-34 (1998)

Tanaka, Sakuta：“使用化学非平衡模型对诱导 SF_6 热等离子体进行瞬态分析”IEEJ Discharge Study Group Materials。1. 29-34 (1998)

Y. Tanaka and T. Sakuta: "Numerical approach for analyzing transient behavior of SFィイD26ィエD2 induction thermal plasma using reaction kinetics"Proc. Proc. 14ィイD1thィエD1 Int. Symp. on Plasma Chemistry. Vol. I. 245-250 (1999)

Y. Tanaka 和 T. Sakuta：“使用反应动力学分析 SFD26D2 瞬态行为”Proc. 14D1D1 Symp. 245-250。