Development of Low-Fregnency Induction Thermal Plasma for Cluster Synthesis
Development of Low-Fregnency Induction Thermal Plasma for Cluster Synthesis
批准号:
08555067
负责人:
SAKUTA Tadahiro
金额:
$7.74万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 1998
中文摘要
1998年,在该项目的第三年,也是最后一年,成功地用低频450 kHz、功率50 kW的MOSFET逆变电源产生了宽区域感应等离子体,其反应区域直径为150 mm,长度为150 mm,使我们能够高速加工或合成材料。用<60>Ar、He和CO_2等离子体诱导热等离子体合成了C_(10)富勒烯。实验结果表明:1)晶体管逆变电源可用于建立频率为450 kHz的电感耦合等离子体。在30 kW的功率水平下,可以在Ar、He和CO2气体环境中产生多种等离子体。与Ar和He等离子体相比,CO2等离子体具有约10,000 K的相对较高的温度。2)这些感应热等离子体对于高达10 g/min的冷碳粉注入速率足够稳定,这是足够高的量以高速率产生C_<60>团簇。3)在几种气体种类条件下进行的实验中,Ar/He惰性气体等离子体具有最高的C_2<60>合成率,而解离CO_2气体等离子体没有C_2的合成<60>。结果表明,自由基C原子和C_2分子的强猝灭效应是合成这种高阶富勒烯材料的必要条件。
英文摘要
In the third and final year of the project, 1998, a wide area induction plasma was successively generated by using MOSFET inverter power supply with a low frequency of 450 kHz and a power of 50 kW.The reaction area of the plasma is as wide as 150-mm diameter and 150-mm length, which enable us the high speed processing or synthesis of materials. C_<60> fullurene synthesis was carried out by using Ar, He and CO_2 induction thermal plasmas. Remarkable results are as follows.1) The transistor inverter supply was found to be useful to establish the inductively coupled plasma with a frequency of 450 kHz. At a power level of 30kW, several kinds of plasma can be generated in Ar, He and CO2 gas circumstance. The CO2 plasma was found to have relatively high temperature around 10,000 K compared to Ar and He plasma.2) These induction thermal plasmas were sufficiently stable for the injection of cold carbon powders up to a rate of 10 g/min, which is high enough quantity to produce the C_<60> cluster with a high rate.3) Among the experiments carried out under several conditions with respects to the gas sort, pressure and the power of plasma, Ar/He noble gas plasma showed the most highest C_<60> synthesis rate, while the dissociative CO_2 gas plasma showed no synthesis of C_<60>. The results indicate that a strong quenching effect of the radical C atom and C_2 molecule is essential for the synthesis of such high order fullurene materials.
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T.Sakuta,K.C.Paul,S.Hatazawa,M.Takahashi,Y.Tanaka: "Spectroscopic Measurements of SF_6 and N_2 Induction Plasmas at Atmospheric Pressure" International Workshop on High Voltage Engineering IWHV'99. I. 109-114 (1999)
T.Sakuta,K.C.Paul,S.Hatazawa,M.Takahashi,Y.Tanaka:“大气压下 SF_6 和 N_2 感应等离子体的光谱测量”高压工程国际研讨会 IWHV99。
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K.C.Paul, T.Sakuta: "Transport and Thermodynamic Properties of SF_6 Gas Contaminated by PTFE reinforced with Al_2O_3 and BN Particles" IEEE Trans.on Plasma Science. Vol.25. 786-798 (1997)
K.C.Paul、T.Sakuta:“Al_2O_3 和 BN 颗粒增强 PTFE 污染的 SF_6 气体的传输和热力学特性”IEEE Trans.on Plasma Science。
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Y.T〓ika,M.Takahashi,K.C.Paul,T.Sakuta: "Transport Thermariynamic Properties of N_2/O_2 Matures it Different Admixture Ratio" International Workshop on High Voltage Engineering IWHV99. I. 103-108 (1999)
Y.T〓ika、M.Takahashi、K.C.Paul、T.Sakuta:“N_2/O_2 的传输热力学特性使其不同的混合比例成熟”高电压工程国际研讨会 IWHV99 (1999)。
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宮本昌弘, 作田忠裕他: "50kHz磁界による大口径誘導熱プラズマの発生" 電気学会論文誌B. Vol.117-B. 671-678 (1997)
Masahiro Miyamoto、Tadahiro Sakuta 等人:“通过 50kHz 磁场产生大直径感应热等离子体”,日本电气工程师学会汇刊 B. 第 117-678 卷(1997 年)。
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番匠俊行,作田忠裕 他: "パルス状電磁界を印加した誘導熱プラズマの解析" 電気学会開閉保護・高電圧合同研究会. SP-96-31. 45-54 (1996)
Toshiyuki Bansho、Tadahiro Sakuta 等人:“通过应用脉冲电磁场分析感应热等离子体”IEEJ 开关保护和高电压联合研究组 SP-96-31 (1996)。
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共 26 条
High-speed synthesis of fullerences by using low-frequency induction thermal plasma with pulse-modulated mode.
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批准号:11555078
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.77万
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财政年份:1999
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负责人:SAKUTA Tadahiro
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依托单位:
Investigation for arc quenching ability of SFィイD26ィエD2 and NィイD22ィエD2 using pulse modulated induction plasma
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批准号:10450103
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$2.94万
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财政年份:1998
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负责人:SAKUTA Tadahiro
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依托单位:
Study of Arc Quenching Properties of SF_6 by Induction Thermal Plasma
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批准号:08650332
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.34万
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财政年份:1996
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负责人:SAKUTA Tadahiro
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依托单位:
GENERATION OF LARGE AREA INDUCTION THERMAL PLASMA BY SUPERIMPOSING 50-KHz OSCILLATING FIELD
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批准号:06650322
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.15万
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财政年份:1994
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负责人:SAKUTA Tadahiro
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依托单位:
EXPANSION EFFECTS OF HIGH TEMPERATURE FIELD OF INDUCTION THERMAL PLASMA BY SUPERIMPOSING LOW FREQUENCY MAGNETIC FIELD
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批准号:03650226
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.22万
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财政年份:1991
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负责人:SAKUTA Tadahiro
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依托单位:
海外基金