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Investigations related to spatial non uniformly of discharge plasmas

Investigations related to spatial non uniformly of discharge plasmas
放电等离子体空间不均匀性的相关研究
批准号:
10650274
负责人:
OHE Kazuyuki
金额:
$1.92万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 1999

项目摘要

项目成果

OHE Kazuyuki的其他基金

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相关文献

中文摘要
翻译
in 1999,experimental and theoretical investigations for rf discharges and their results发表在科学期刊作为follows,1. The electron energy distribution (EEDF) was measuredusing a single probe in an inductively coupled Ar/CF D24 D2 plasma over the pressure range from 3to 30mtorr keeping the input power at 50w . the EEDF is a bie - maxwellian in the pressure lower than10 mTorr in spite of varying the mixing ratio of Ar to Cf - D24 - D2,while the EEDF becomes a Druyvesteyn one with increasing CF D24 D2 at 30mtorr .2. the EEDF wasmeasured in a capacitivity coupled Ar plasma over the pressure range from 0.03 to 0.1 Torr keepingthe rf current constant at 140ma by varying the gap length. the EEDF savi - maxwellian in thepressure lower than 0.05 Torr,while it becomes a bie - maxwellian to a maxwellian and a Druyvesteyn in the pressure higher than 0.07Torr.These gap dependences of EEDF can be explained by the change of heating mechanism from thestochastic to joule heatings in the high energy regionwhile by the comparison of the elastic collision frequency and the e-e collision one in the lowenergy。
英文摘要
In 1999, experimental and theoretical investigations were preformed for rf discharges and their results were published in scientific journal as follows,1. The electron energy distribution (EEDF) was measured using a single probe in an inductively coupled Ar/CFィイD24ィエD2 plasma over the pressure range from 3 to 30 mTorr keeping the input power at 50W. The EEDF is a bi-Maxwellian in the pressure lower than 10 mTorr in spite of varying the mixing ratio of Ar to CfィイD24ィエD2, while the EEDF becomes a Druyvesteyn one with increasing CFィイD24ィエD2 at 30 mTorr.2. The EEDF was measured in a capacitivity coupled Ar plasma over the pressure range from 0.03 to 0.1 Torr keeping the rf current constant at 140 mA by varying the gap length. The EEDF s a bi-Maxwellian in the pressure lower than 0.05 Torr, while it becomes a bi-Maxwellian to a maxwellian and a Druyvesteyn in the pressure higher than 0.07 Torr.These gap dependences of EEDF can be explained by the change of heating mechanism from the stochastic to joule heatings in the high energy region, while by the comparison of the elastic collision frequency and the e-e collision one in the low energy.
期刊论文(10)
专著(0)
科研奖励(0)
会议论文
大村高志、加賀広持、大江一行: "Gap length dependence of electron energy distribution in low pressure Ar capacitively-coupled RF discharges"Jpn. J. Appl. Phys.. 39(in press). (2000)
Takashi Omura、Hiromochi Kaga、Kazuyuki Oe:“低压 Ar 电容耦合射频放电中电子能量分布的间隙长度依赖性”Jpn. J. Phys.. 39(出版中)。
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通讯作者:
大村高志、大江一行: "Probe measurements and global model of inductively coupled Ar/CF_4 discharges"Plasma Source. Sci. Tech.. 8. 553-560 (1999)
Takashi Omura、Kazuyuki Oe:“感应耦合 Ar/CF_4 放电的探针测量和全局模型”Plasma Source。8. 553-560 (1999)
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通讯作者:
T.Kimura and K.Ohe: "Probe measurements and global model of inductively-coupled Ar/CF_4 discharges"Plasma Sources Sci.Technol.. 8. 553-560 (1999)
T.Kimura 和 K.Ohe:“感应耦合 Ar/CF_4 放电的探针测量和全局模型”Plasma Sources Sci.Technol.. 8. 553-560 (1999)
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通讯作者:
T.Kimura,K.Kaga and K.Ohe: "Gap length dependence of electron energy distribution in low pressure Ar capacitively-coupled RF discharges"Jpn.J.Appl.Pbup.. (印刷中). (2000)
T.Kimura、K.Kaga 和 K.Ohe:“低压 Ar 电容耦合射频放电中电子能量分布的间隙长度依赖性”Jpn.J.Appl.Pbup..(出版中)。
DOI: --
发表时间:
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影响因子: --
作者: []
通讯作者:
10
    Studies of high concentration O_3 production using on-off narrow gap barrier discharge and its spatial transfer
    • 批准号:
      12650273
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $2.3万
    • 财政年份:
      2000
    • 负责人:
      OHE Kazuyuki
    • 依托单位:
    海外基金