GROWTH MECHANISM AND PROPERTIES OF HYDROGENATED AMORPHOUS CARBON THIN FILMS

氢化非晶碳薄膜的生长机理及性能

• 批准号: 10650314
• 负责人: TOGUCHI Minoru
• 金额: $ 2.24万
• 依托单位: UNIVERSITY OF THE RYUKYUS
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10650314/
• 关键词: HYDROGENATED AMORPHOUS CARBON THIN FILM; VHF PLASMA; SPUTTERING; HYDOROGEN PARTIAL PRESSURE; PLASMA TREATMENT; SUBSTRATE BIAS

IN THIS STUDY, GROWTH CONDITIONS AND THE FILM STRUCTURE OF HAYDROGENATED AMORPHOUS CARBON FILMS BY SPUTTERING USING VHF PLASMA WERE INVESTIGATED. STRUCTURAL CHANGES OF THE FILMS BY PLASMA TREATMENT IS ALSO INVESTIGATED.AS APPLYING SUBSTRATE BIAS, THE RANGE OF HYDROGEN PARTIAL PRESSURE IN WHICH THE FILMS WERE ABLE TO BE FORMED BECOMES NARROW. THE DEPENDENCE OF HYDROGEN CONTENT IN THE A-C: H FILMS PREPARED WITH SUBSTRATE BIAS ON HYDROGEN PARTIAL PRESSURES IS SIMILAR TO THAT WITHOUT SUBSTRATE BIAS. HOWEVER, THE PARTIAL PRESSURE AT THE MAXIMUM OF THE HYDROGEN CONTENT IN THE FILM SHIFTS TOWARD LOW PRESSURE IN CASE OF APPLYING SUBSTRATE BIAS.IT IS FOUND THAT THE OPTICAL ENERGY GAPS AND THE REFRACTIVE INDEX OF THE FILMS DEPEND ON STRONGLY THE HYDROGEN CONTENT IN THE FILMS. FURTHERMORE, IT IS ALSO FOUND THAT TREND OF THE CHANGES OF THE STRUCTURE AND OPTICAL GAPS OF THE FILMS BY PLASMA TREATMENT DEPEND ON THE HYDROGEN CONTENTS IN THE FILMS AS PREPARED.

本文研究了用VHF等离子体溅射法制备氢化非晶碳薄膜的生长条件和薄膜结构。等离子体处理后薄膜的结构发生了变化，当施加衬底偏压时，能够形成薄膜的氢分压范围变窄。在有衬底偏压的A-C：H薄膜中，氢含量对氢分压的依赖性与无衬底偏压时的相似。但在施加衬底偏压时，薄膜中氢含量最大值处的分压向低压方向移动，薄膜的光学能隙和折射率与薄膜中的氢含量密切相关。此外，还发现等离子体处理后薄膜的结构和光学带隙的变化趋势与所制备薄膜中的氢含量有关。

项目成果

MATSUI KENJI: "INFLUENCE OF SUBSTRATE BIAS ON HYDROGENATED AMORPHOUS CARBON FILMS PREPARED BY VHF SPUTTERING"BULLTIN OF THE FUCULTY OF ENGINEERING UNIVERSITY OF THE RYUKYUS. NO.59. 101-106 (2000)

松井贤治：“基板偏压对甚高频溅射制备的氢化非晶碳薄膜的影响”琉球工程大学系通报。

勢理客勝則: "a-C:H薄膜のプラズマ処理による構造変化"琉球大学工学部紀要. 第58号. 99-103 (1999)

Katsunori Serika：“等离子体处理导致的 a-C:H 薄膜的结构变化”，琉球大学工程学院公告，第 58. 99-103 号（1999 年）。

松井謙治: "VHFスパッタリング法により作製した水素化アモルファス炭素薄膜の基板バイアスの効果"琉球大学工学部紀要. 第59号. 101-106 (2000)

Kenji Matsui：“衬底偏压对 VHF 溅射制备的氢化非晶碳薄膜的影响”琉球大学工程学院公告第 59. 101-106 (2000)。

KATSUNORI SERIKYAKU: "STRUCTURAL CHANGES OF HYDORGANATED CARBON THIN FILMS BY PLASMA TREATMENT"BULLIN OF THE FUCULTY OF ENGINEERING UNIVERSITY OF THE RYUKYUS. NO.58. 99-103 (1999)

KATSUNORI SERIKYAKU：“等离子处理对氢化碳薄膜的结构变化”，琉球工程大学学报。