GROWTH MECHANISM AND PROPERTIES OF HYDROGENATED AMORPHOUS CARBON THIN FILMS

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IN THIS STUDY, GROWTH CONDITIONS AND THE FILM STRUCTURE OF HAYDROGENATED AMORPHOUS CARBON FILMS BY SPUTTERING USING VHF PLASMA WERE INVESTIGATED. STRUCTURAL CHANGES OF THE FILMS BY PLASMA TREATMENT IS ALSO INVESTIGATED.AS APPLYING SUBSTRATE BIAS, THE RANGE OF HYDROGEN PARTIAL PRESSURE IN WHICH THE FILMS WERE ABLE TO BE FORMED BECOMES NARROW. THE DEPENDENCE OF HYDROGEN CONTENT IN THE A-C: H FILMS PREPARED WITH SUBSTRATE BIAS ON HYDROGEN PARTIAL PRESSURES IS SIMILAR TO THAT WITHOUT SUBSTRATE BIAS. HOWEVER, THE PARTIAL PRESSURE AT THE MAXIMUM OF THE HYDROGEN CONTENT IN THE FILM SHIFTS TOWARD LOW PRESSURE IN CASE OF APPLYING SUBSTRATE BIAS.IT IS FOUND THAT THE OPTICAL ENERGY GAPS AND THE REFRACTIVE INDEX OF THE FILMS DEPEND ON STRONGLY THE HYDROGEN CONTENT IN THE FILMS. FURTHERMORE, IT IS ALSO FOUND THAT TREND OF THE CHANGES OF THE STRUCTURE AND OPTICAL GAPS OF THE FILMS BY PLASMA TREATMENT DEPEND ON THE HYDROGEN CONTENTS IN THE FILMS AS PREPARED.