Ultra High Sensitive Electron Bombarded Imager
Ultra High Sensitive Electron Bombarded Imager
批准号:
10650341
负责人:
TAKETOSHI Kazuhisa
金额:
$2.11万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 2001
中文摘要
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英文摘要
We studied characteristics of electron bombaraded(EB)gain, excess noise factor, resolution, optimum thickness for EB-AMI. ZnCdTe sensor layer is overlaid on AMI. EB-gain is 1500 at 10 kV. Resolution is excellent since there is no connecting fiber. Random noise, white spots, lag and sticking cannot be detectable. Fatigue of running of 5000hr is excellent, is under detection although that of a-Si sensor is strong. The threshold voltage of 2kV is explained as penetration loss of Al, Six_2Nix_2 Optimal sensor thickness is 0.83 μm. Lateral expansion of electron excited in sensor is 0.2μm. theoretical excess noise factor is 1.2 and agrees with observed values.
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Taketosi, Andd: "Sludies of multiplication ponchos of EB-AMI"IEEE.ED.. 46. 1619-1622 (1999)
Taketosi, Andd:“EB-AMI 乘法斗篷的研究”IEEE.ED.. 46. 1619-1622 (1999)
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K.Taketoshi: "Developmento of a Novel Image Intensifier of an Amplified MOS Imager Overland with EB a-Si" IEEE ED. 45,4. 778-784 (1998)
K.Taketoshi:“采用 EB a-Si 开发新型放大 MOS 成像仪图像增强器”IEEE ED。
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"Studies of Multiplication Process of a Novel Image Intensifier of an Amplified Metal-Oxide-Semiconductor Imager Overlaid with Elect-ron -Bombarded Amorphous Silicon" IEEE ED. accepted to be published. (1999)
“电子轰击非晶硅覆盖的放大金属氧化物半导体成像器的新型图像增强器的乘法过程研究”IEEE ED。
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Saito, Taketoshi, Kozu: "Study of Ring-to-dam structural change by RNC"J. Vac. Soc. Jap. Vol.44 Vol.2. 105-108 (2001)
Saito、Taketoshi、Kozu:“RNC 对环坝结构变化的研究”J。
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Saito, Taketoshi: "Development of ED-AMI"J.Vac.Soc.. 44. 105-108 (2001)
Saito Taketoshi:“ED-AMI 的发展”J.Vac.Soc.. 44. 105-108 (2001)
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共 13 条
Devolopment of Amplified GaAs Imager
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批准号:07650403
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.45万
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财政年份:1995
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负责人:TAKETOSHI Kazuhisa
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依托单位: