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Processing of New Functional Material Using Electron Beam Excited Plasma

电子束激发等离子体加工新型功能材料

基本信息

批准号：
11650140
负责人：
ABRAHA Petros
金额：
$ 0.51万
依托单位：
Meijo University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1999
资助国家：
日本
起止时间：
1999 至 2000
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11650140/
关键词：
Pulsed laser Thickness distribution Ablation Deposition Thin films Vacuum chamber High aspect ratio deposition laser ablation thin film plasma vacuum chamber

项目摘要

Pulsed laser beams irradiated onto the target surface produce plasma containing atomic scale particles and droplets of various sizes. These emitted particles travel in the direction of the target normal. Various useful engineering practices can be envisaged by depositing these particles on the surface of a substrate. The expanding plasma is usually forward peaked and the degree of forward peaking primarily depends on the dimensions of the laser beam on the target surface, the laser energy density and wavelength and pulse duration. These factors determine the film uniformity and homogeneity that are of significant importance in manufacturing. In this research at first, numerical calculations that predict the deposit thickness distribution were set based on hydrodynamical model. Then, the results were compared with experimental results obtained by irradiating a focussed pulse laser beam onto the surface of an aluminum tape target. The thickness distributions of the deposited film are mea … More sured in the vertical and horizontal directions. Our experiments and numerical calculations show close resemblance. Based on the results of the thickness distributions, practical recipes relevant to deposition practice are presented. Here are the conclusions drawn from the experimental and predicted simulation of this research.1. The deposit area produced from a high aspect ratio irradiated target area is narrow in the direction parallel to the longer side and wide in the direction parallel to the shorter side of the irradiated area. The degree depends on the value of the aspect ratio of the irradiated target area.2. The deposit area produced from a spot, square, irradiated target area has the same dimension in all directions. And the deposit area produced from a square irradiated target area is wider than the deposit area produced from a high aspect ratio irradiated area.3. Thus, the deposition rate of high aspect ratio substrates can be greatly improved by simply focussing the laser beam into a high aspect ratio irradiated area. The thickness uniformity can be obtained by rotating the substrate while scanning along the required deposition area. Less

脉冲激光束照射到目标表面上产生包含原子尺度颗粒和各种尺寸的液滴的等离子体。这些发射的粒子沿目标法线的方向行进。通过将这些颗粒沉积在基底表面上，可以设想各种有用的工程实践。膨胀的等离子体通常是前向峰化的，并且前向峰化的程度主要取决于靶表面上的激光束的尺寸、激光能量密度和波长以及脉冲持续时间。这些因素决定了在制造中非常重要的膜均匀性和均匀性。本研究首先基于流体动力学模型建立了预测存款厚度分布的数值计算方法。然后，将结果与通过将聚焦的脉冲激光束照射到铝带靶的表面上获得的实验结果进行比较。沉积膜的厚度分布是mea ...更多信息在垂直和水平方向上进行测量。我们的实验和数值计算显示了密切的相似性。在此基础上，提出了适合实际的工艺配方。以下是从本研究的实验和预测模拟中得出的结论。由高纵横比的被照射目标区域产生的存款区域在平行于被照射区域的长边的方向上窄，而在平行于被照射区域的短边的方向上宽。该程度取决于被照射目标区域的纵横比的值。2.从点状、方形、照射的目标区域产生的存款区域在所有方向上具有相同的尺寸。并且由正方形照射靶区域产生的存款区域比由高纵横比照射区域产生的存款区域宽。因此，通过简单地将激光束聚焦到高纵横比照射区域中，可以大大提高高纵横比基板的沉积速率。厚度均匀性可以通过旋转衬底同时沿着所需沉积区域扫描来获得。少