Improving of Crystal Quality of Optical Computing Devices

光计算器件晶体质量的提高

• 批准号: 11650328
• 负责人: YOKOTANI Atsushi
• 金额: $ 2.11万
• 依托单位: Miyazaki University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11650328/
• 关键词: optical computing; barium titanate; pulsed laser deposition; 膜質向上; チタン酸バリウム; エキシマレーザー; フェムト秒レーザー; 膜質の向上

In this research, barium titanate thin films have been fabricated by the pulsed laser deposition method in order to investigate the effects of deposition conditions on the qualities of deposited films. Especially, effects of target preparation condition, the substrate temperature, the pressure of the ambient gases and so on have been investigated.A KrF excimer laser was used for the light source. The pressed powder and sintered targets were used. The temperature of the silicon substrate was raised and controlled by using an infrared heating unit. The qualities of the deposited film were characterized by means of the x-ray diffraction, the ellipsometry, and the scanning electron microscopy.As a result of the electron microscopy, it was found that the flatness of the films was strongly influenced by the laser fluence and flatness and smoothness of films could be improved by using the laser fluence of more than 5 J/cm^2 compared to the lower fluences which were conventionally used. From the results of the x-ray diffraction and ellipsometry, it was also found that the degree of crystallization of the film was strongly influenced by the substrate temperature and the crystalline film could be obtained at a temperature of more than 600 ℃.Besides above, new fabrication techniques of optical waveguides from the obtained films were also investigated. As a result, a new laser processing technique and a new photo-chemical vapor deposition technique have been established.

本研究采用脉冲激光沉积法制备钛酸钡薄膜，以研究沉积条件对沉积薄膜质量的影响。特别是研究了靶材制备条件、衬底温度、环境气体压力等的影响。光源采用KrF准分子激光器。使用压制粉末和烧结靶。使用红外加热装置升高和控制硅衬底的温度。通过X射线衍射、椭偏仪和扫描电子显微镜对沉积薄膜的质量进行了表征。电子显微镜结果发现，薄膜的平整度受激光注量的影响很大，与传统使用的较低注量相比，使用大于5 J/cm^2的激光注量可以提高薄膜的平整度和光滑度。从X射线衍射和椭圆光度的结果还发现，薄膜的结晶度受衬底温度的影响很大，在超过600℃的温度下可以获得结晶薄膜。除此之外，还研究了用所得薄膜制备光波导的新技术。由此，建立了新的激光加工技术和新的光化学气相沉积技术。

项目成果

A.Kameyama: "Identification of defects associated with second-order optical nonlinearity in thermally poled high-purity silica glasses"Journal of Applied Physics. 89(.9). (2001)

A.Kameyama：“热极化高纯石英玻璃中与二阶光学非线性相关的缺陷的识别”应用物理学杂志。

K.Kurosawa: "Silica Film preparation by chemical vapor deposition using vacuum ultraviolet excimer lams"Applied Surfase Science. Vol.168. 37-40 (2000)

K.Kurosawa：“使用真空紫外准分子灯通过化学气相沉积制备二氧化硅薄膜”应用表面科学。

A.Kameyama: "Identification of defects associated with second-order optical nonlinearity in thermally poled high-purity silica glasses"Journal of Applied Physics. Vol.89 (9), (in press). (2001)

A.Kameyama：“热极化高纯石英玻璃中与二阶光学非线性相关的缺陷的识别”应用物理学杂志。

S.Konagayoshi: "Fabrication of sapphire thin films by the femtosecond laser ablation technique"Memoirs of the Faculty of Engineering, Miyazaki Univ.. Vol.29. 99-104 (2000)

S.Konagayoshi：“通过飞秒激光烧蚀技术制造蓝宝石薄膜”宫崎大学工学部回忆录第29卷。

A.Yokotani: "A new scheme for fabrication of oxide coating for organic optical materials by photo-chemical vapor deposition using an excimer lamp"Nonlinear Optics. 22. 465-468 (1999)

A.Yokotani：“使用准分子灯通过光化学气相沉积制造有机光学材料氧化物涂层的新方案”非线性光学。