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Band Engineering on Alloy of Fluorides for Heterodevices

Band Engineering on Alloy of Fluorides for Heterodevices
异质器件氟化物合金能带工程
批准号:
12650304
负责人:
TSUTSUI Kazuo
金额:
$2.24万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2001

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项目成果

TSUTSUI Kazuo的其他基金

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中文摘要
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英文摘要
The purpose of this research was the artificial control of energy level of conduction band on fluoride alloys of composed of CaF_2 and CdF_2 which were epitaxially grown on Si substrates, and demonstrate feasibility of the technique to be applied for quantum effect hetero devices.First, the CaF_2 buffer layer which was expected to be necessary to obtain good Ca_xCd_<1-x>F_2 alloy on Si was investigated. It was found that the CaF_2 buffer layer was able to be thin down to two mono-layers keeping good crystallinity and morphology of overgrown Ca_xCd_<1-x>F_2 layers. The minimum thickness was fond to fit applications of various tunnel devices since electrons can tunnel the layers.The internal photon emission(IPE) analysis was carried out on the Au/Ca_xCd_<1-x>F_2/Si(111) diode structures, where photo emission current depending on wave length ofexiting light. As a result, it was shown that energy level of conduction bad edge of Ca_xCd_<1-x>F_2 was lineally changed depending on the composit … More ion of Ca_xCd_<1-x>F_2, for the first time. It was also confimied that the energy barrier of conduction bad edge of CaF2 for that of Si was 2.3 eV through the IPE measurement, and that the value was consistent with those obtained by X-ray photoelectron spectroscopy in the previous work From these results, it was indicated that band engineering on the fluoride alloy system, Ca_xCd_<1-x>F_2, was promising.Finally, double barrier resonant tunneling diodes (RTDs) in which the Ca_xCd_<1-x>F_2 was employed in the barrier layers were fabricated, and they were compared to the conventional diodes in which pure CaF2 was employed in the barrier layers. The RTDs using Ca_xCd_<1-x>F_2 barrier exhibited good negative differential current-voltage characteristics. Furthermore, higher current density in spite of thicker barrier kyer on the RTD using Ca_xCd_<1-x>F_2 barrier than those using pure CaF2 was observed, which indicated controllability of barrier height on the RTDs by composition of the fluoride alloy system. Less
期刊论文(15)
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Growth Characteristics of Ca_xCd_<1-x>F_2 Films on Si Substrates Using CaF_2 Buffer Layer
CaF_2缓冲层在Si衬底上Ca_xCd_<1-x>F_2薄膜的生长特性
DOI: --
发表时间: 2002
期刊: J. of Crystal Growth 237-239
影响因子: --
作者: [H.Kanibayashi, T.Gotoh, H.Maeda, K.Tsutsui]
通讯作者: K.Tsutsui
T.Gotoh,H.Kambayashi and K.Tsutsui: "Epitaxial Growth of Ca_xCd_<1-x>F_2 Mixed Crystal Films on Si Substrates"Jpn.J.Appl.Phys.. 39(5B). L476-L478 (2000)
T.Gotoh、H.Kambayashi 和 K.Tsutsui:“Ca_xCd_<1-x>F_2 混合晶体薄膜在 Si 衬底上的外延生长”Jpn.J.Appl.Phys.. 39(5B)。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
Si基板上の活性層埋め込み型弗化物共鳴トンネルダイオードの製作
Si衬底上有源层嵌入氟化物谐振隧道二极管的制作
DOI: --
发表时间: 2002
期刊: 第49回応用物理学関係連合講演会予稿集(講演番号28a-K-1)
影响因子: --
作者: [渡邊聡, 神林宏, 関根広志, 筒井一生]
通讯作者: 筒井一生
Si基板上のエピタキシャルCaCdF_2混晶層の電気的特性
Si衬底上外延CaCdF_2混晶层的电学特性
DOI: --
发表时间: 2001
期刊: 第62回応用物理学会学術講演会予稿集(講演番号14a-YB-7)
影响因子: --
作者: [神林宏, 前田寛, 筒井一生]
通讯作者: 筒井一生
12
    Fabrication of fluoride resonant tunneling devices on Si with stable electrical properties by using surface inactive layers
    • 批准号:
      20360004
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $11.15万
    • 财政年份:
      2008
    • 负责人:
      TSUTSUI Kazuo
    • 依托单位:
    Integrated Gountum Devices using Fluoride Heterostructures
    • 批准号:
      10450133
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $7.04万
    • 财政年份:
      1998
    • 负责人:
      TSUTSUI Kazuo
    • 依托单位:
    "Interface Controlled Heteroepitaxy of Ionic Crystals and Covalent Crystals Using Ionicity Control Layr"
    • 批准号:
      05650025
    • 项目类别:
      Grant-in-Aid for General Scientific Research (C)
    • 资助金额:
      $1.41万
    • 财政年份:
      1993
    • 负责人:
      TSUTSUI Kazuo
    • 依托单位: