THEORETICAL STUDY ON DYNAMICS OF ATOMIC ARRANGEMENT AT STEPS
THEORETICAL STUDY ON DYNAMICS OF ATOMIC ARRANGEMENT AT STEPS
批准号:
13640326
负责人:
KAWAMURA Takaaki
金额:
$2.11万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2003
中文摘要
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英文摘要
We have studied behavior of steps and effect of steps in growth and decay of islands on a surface using a kinetic Monte Carlo simulation. We have also developed a reflection high energy electron diffraction (RHEED) code which calculates a wave function in a crystal in order to analyze atomic structures around steps.Our prime results are summarized as follows.1)We reveal that surface diffusion is not a simple process. When an island on a terrace decays, an atom at a step of the island moves out of it, but it is quite rare for the atom to move directly to a step away from the island. An atom hopping from the terrace and the resulting atomic vacancy play an important role ; once it hops out of the terrace, there is no distinction between a diffusing atom from the island and the hop-up atom.2)We reveal a change in a role of step during formation of an island on Si(100)-2 x1 terrace. A so-called Sb-type step acts as a drain of diffusing atoms before formation of an island but it acts as a source after starting the formation. The change of role promotes the island formation.3)Decay of an island is interpreted as a process of decreasing the step length and total hopping rate of atoms. As the hopping rate of atom at step is higher than that on terrace, a step atom moves more frequently to reduce the number of step atoms.4)We have shown that under surface resonance condition, a RHEED wave function is quite localized at the surface. The localization occurs as a result of multiple scattering of surface waves which propagate nearly parallel to the surface.
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H.Watanabe et al.: "Origin of the domain contrast on a Si(001)-2x1 surface imaged by secondary electrons"Applied Physics Letters. 78. 1255-1257 (2001)
H.Watanabe 等人:“二次电子成像的 Si(001)-2x1 表面上的磁畴对比度的起源”应用物理快报。
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通讯作者:
T.Fukamachi, R.Negishi, S.Zhou, M.Yoshizawa, T.Kawamura: "Extinction effect and Borrmann effect of resonant dynamical scattering in the Bragg case"Acta Cryst.. A58. 552-558 (2002)
T.Fukamachi、R.Negishi、S.Zhou、M.Yoshizawa、T.Kawamura:“布拉格情况下共振动态散射的消光效应和博尔曼效应”Acta Cryst.. A58。
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豊島沙織, 川村隆明: "Si(100)面上に形成された2次元島の崩壊における原子拡散"表面科学. 23・7. 431-436 (2002)
Saori Toyoshima、Takaaki Kawamura:“Si(100) 表面上形成的二维岛塌陷中的原子扩散”表面科学 23・7。
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S.Toyoshima, T.Kawamura: "Effect of Temperature Difference on Adatom Diffusion and Growth of Nano-island on Si(100) Surface"Japanese Journal of Applied Physics. 43・5. L595-L598 (2004)
S.Toyoshima、T.Kawamura:“温差对 Si(100) 表面吸附原子扩散和纳米岛生长的影响”日本应用物理学杂志 L595-L598 (2004)。
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T.Kawamura, S.Toyoshima, A.Ichimiya: "Decay of pyramidal nano-island formed on Si(100) studied by kinetic Monte Carlo simulation"Surface Science. 514. 60-67 (2002)
T.Kawamura、S.Toyoshima、A.Ichimiya:“通过动力学蒙特卡罗模拟研究了 Si(100) 上形成的金字塔形纳米岛的衰变”表面科学。
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共 8 条
Theoretical study of an in-situ phase retrieval algorithm for Reflection High-Energy Electron Diffraction during growth
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批准号:25400321
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.83万
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财政年份:2013
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负责人:KAWAMURA Takaaki
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依托单位:
Theoretical study of the origin of RHEED intensity oscillation during growth by molecular beam epitaxy and of the growth mode
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批准号:20540313
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.91万
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财政年份:2008
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负责人:KAWAMURA Takaaki
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依托单位:
海外基金