Fabrication of Super-Heterostructures for Advanced Optoelectronic Quantum Devices
Fabrication of Super-Heterostructures for Advanced Optoelectronic Quantum Devices
批准号:
15360159
负责人:
WATANABE Masahiro
金额:
$9.28万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2005
中文摘要
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英文摘要
New type of light emitting devices or electron devices for future LSI technology using Super-heterostructures are studied. Intersubband quantum cascade lasers using CdF_2-CaF_2 heterostructures have been proposed and novel crystal growth technique Nanoarea-Local-Epitaxy has been demonstrated. Energy subbands in the quantum wells has been confirmed using resonant tunneling diode with double- and triple-barrier structures. And moreover, spontaneous emission from CdF_2-CaF_2 single cascade structures has been observed for the first time.Results obtained in this research are as follows.(1) Near-infrared electroluminescence from a single-period (CdF_2/CaF_2) inter-subband quantum cascade structure on a Si substrate has been observed for the first time. The CdF_2/CaF_2 heterostructure is a good candidate for realizing a Si-based short-wavelength quantum cascade laser because of its large conduction band discontinuity of 2.9 eV and small lattice mismatch with the Si substrate. In the experiment, an active region consisting of (CdF_2/CaF_2) heterostructures was grown epitaxially on the Si substrate by molecular beam epitaxy, and an Au/Al electrode was evaporated on the active region. The wafer was polished mechanically and cleaved. Electroluminescence from the device was observed in the near-infrared region at room temperature for the first time.(2) Epitaxial growth of high-quality CdF_2/CaF_2 heterostructures on Si(100) substrate has been demonstrated using Nanoarea-Local-Growth and in-situ post-annealing for solid phase epitaxy. Using this method, room temperature high peak to valley current ratio (>10^5) of CdF_2/CdF_2 resonant tunneling diode structures has been demonstrated on Si(100) substrate for the first time.
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Negative Differential Resistance of CdF_2/CaF_2 Resonant Tunneling Diode Grown on Si(100) Substrate
Si(100)衬底上生长的CdF_2/CaF_2谐振隧道二极管的负微分电阻
DOI:
--
发表时间:
2004
期刊:
2004 Silicon Nanoelectronics Workshop 9-20
影响因子:
--
作者:
[M.Watanabe, T.Kanazawa, K.Jinen, M.Asada]
通讯作者:
M.Asada
Improvement of Crystalline Quality of BeZnSe Using Buffer Layer by Migration Enhanced Epitaxy on GaP(001) Substrate
GaP(001)衬底上迁移增强外延利用缓冲层提高BeZnSe的结晶质量
DOI:
--
发表时间:
2005
期刊:
Jpn. J. Appl. Phys. vol.44,No.2
影响因子:
--
作者:
[T.Yokoyama, Y.Niiyama, T Murata, M.Watanabe]
通讯作者:
M.Watanabe
Y.Niiyama, T.Yokoyama, M.Watanabe: "Effect of Buffer Layer for Epitaxial Growth of High Magnesium Content BeMg ZnSe Lattice Matched to GaP(001) Substrate"Jpn.J.Appl.Phys.. vol.42.6A. L599-L602 (2003)
Y.Niiyama、T.Yokoyama、M.Watanabe:“缓冲层对与 GaP(001) 基板匹配的高镁含量 BeMg ZnSe 晶格的外延生长的影响”Jpn.J.Appl.Phys.. vol.42.6A。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
Epitaxial growth and optical properties for ultraviolet region of BeMgZnSe on GaP (001) Substrate
GaP(001)衬底上BeMgZnSe的外延生长及紫外区光学特性
DOI:
--
发表时间:
2004
期刊:
Phys. Stat. Solid. (b) vol.241
影响因子:
--
作者:
[Y.Niiyama, T.Yokoyama, M.Watanabe]
通讯作者:
M.Watanabe
Optically pumped ultraviolet lasing of BeMgZnSe based quan-tum well laser structures
BeMgZnSe 基量子阱激光器结构的光泵浦紫外激光
DOI:
--
发表时间:
2006
期刊:
Phys. Stat. Solid. (c) vol.3,No.4
影响因子:
--
作者:
[Y.Niiyama, T.Murata, M.Watanabe]
通讯作者:
M.Watanabe
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