DEVELOPMENT OF SMART NANO-SENSORS BY HYBRID INTEGRATION OF CSD-DERIVED THIN FILMS

通过 CSD 衍生薄膜的混合集成开发智能纳米传感器

基本信息

  • 批准号:
    16360325
  • 负责人:
  • 金额:
    $ 6.98万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 财政年份:
    2004
  • 资助国家:
    日本
  • 起止时间:
    2004 至 2006
  • 项目状态:
    已结题

项目摘要

Lead zirconate titanate (PZT) thin films have been attracting worldwide interests in exploring their potential properties [1-3] or the origins [4-6] of their excellent dielectic, ferroelectric and piezoelectric properties near the morphotropic phase boundary (MPB). PZT thin films are expected to apply to the memory devices, micro electro mechanical systems (MEMS), and display because of their superior ferroelectric, pyroelectric, piezoelectric and electron emission properties.In this study, high-performance piezoelectric PZT thin films for actuated mirror array and optical scanner were developed by controlling the several factors, such as molecular-designed precursor, seeding layer and the residual stress in films, by a chemical solution deposition (CSD).The other factors that affect the electrical properties of the CSD-derived PZT thin films are composition, thin film electrode and the residual stress in the resultant films which strongly depends on the substrate including thin film electrode and the annealing processes as well as the film thickness. The film composition is easy to control if the molecular-designed precursor solution is used. In this paper, we mainly prepared PZT precursor solution with a composition near morphotropic phase boundary (MPB ; Pb : Zr : Ti = 120:53:47) and used Pt/Ti/SiO_2/Si substrate because of the compatibility with the semiconductor. Therefore, the last important factor we focused in this paper is the residual stress in the films because ferroelectricity and piezoelectricity should be strongly affected by the residual stress in the films which is strongly affected by the thin film processing.
锆钛酸铅(PZT)薄膜在相界附近具有优异的介电、铁电和压电性能,其潜在性质[1-3]或其优异的介电、铁电和压电性能的来源[4-6]已引起世界各国的广泛关注。PZT薄膜具有优异的铁电、热释电、压电和电子发射性能,有望应用于存储器件、微电子机械系统(MEMS)和显示器。本研究通过控制分子设计的前驱体、种子层和薄膜中的残余应力等因素,制备了用于驱动反射镜阵列和光学扫描器的高性能PZT薄膜。影响CSD制备的PZT薄膜电学性能的其他因素包括:薄膜电极和薄膜中的残余应力强烈依赖于衬底,包括薄膜电极和热处理工艺,以及薄膜厚度。如果使用分子设计的前驱体溶液,薄膜成分很容易控制。在本文中,我们主要制备了PZT前驱体溶液,其组成接近准同型相界(MPB;Ph:Zr:Ti=120:53:47),由于与半导体的兼容性,我们使用了Pt/Ti/SiO_2/Si衬底。因此,本文关注的最后一个重要因素是薄膜中的残余应力,因为薄膜的铁电性和压电性都会受到薄膜中的残余应力的强烈影响,而薄膜的加工工艺会对薄膜中的残余应力产生强烈的影响。

项目成果

期刊论文数量(26)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Orientation control and electrical properties of PZT/LNO capacitor through chemical solution deposition
  • DOI:
    10.1016/j.jeurceramsoc.2005.09.037
  • 发表时间:
    2006
  • 期刊:
  • 影响因子:
    5.7
  • 作者:
    Hisao Suzuki;Y. Miwa;T. Naoe;H. Miyazaki;T. Ota;M. Fuji;Minoru Takahashi
  • 通讯作者:
    Hisao Suzuki;Y. Miwa;T. Naoe;H. Miyazaki;T. Ota;M. Fuji;Minoru Takahashi
Residual stress in lead titanate thin film on different substrates
  • DOI:
    10.1016/s0955-2219(03)00454-0
  • 发表时间:
    2004
  • 期刊:
  • 影响因子:
    5.7
  • 作者:
    T. Ohno;D. Fu;Hisao Suzuki;Hidetoshi Miyazaki;K. Ishikawa
  • 通讯作者:
    T. Ohno;D. Fu;Hisao Suzuki;Hidetoshi Miyazaki;K. Ishikawa
Chemical solution deposition of PZT/oxide electrode thin film capacitprs with preferred orientation of Si substrate
化学溶液沉积硅衬底择优取向PZT/氧化物电极薄膜电容器
  • DOI:
  • 发表时间:
    2006
  • 期刊:
  • 影响因子:
    0
  • 作者:
    H.Suzuki;Y.Miwa;T.Ohno;M.Fujimoto
  • 通讯作者:
    M.Fujimoto
Chemical Solution Deposition of Conductive SrRuO_3 Thin Film on Si Substrate
Si衬底上化学溶液沉积导电SrRuO_3薄膜
Preparation and evaluation of LaNiO3 thin film electrode with chemical solution deposition
  • DOI:
    10.1016/s0955-2219(03)00382-0
  • 发表时间:
    2004
  • 期刊:
  • 影响因子:
    5.7
  • 作者:
    H. Miyazaki;T. Goto;Y. Miwa;T. Ohno;Hisao Suzuki;T. Ota;Minoru Takahashi
  • 通讯作者:
    H. Miyazaki;T. Goto;Y. Miwa;T. Ohno;Hisao Suzuki;T. Ota;Minoru Takahashi
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SUZUKI Hisao其他文献

Spontaneous superlattice formation and electrical properties of Sr-excess SrTiO<sub>3</sub> thin film deposited on SrTiO<sub>3</sub>(101) by dynamic aurora pulsed laser deposition
动态极光脉冲激光沉积SrTiO<sub>3</sub>(101)上Sr过量SrTiO<sub>3</sub>薄膜的自发超晶格形成及电学性能
  • DOI:
    10.2109/jcersj2.20232
  • 发表时间:
    2021
  • 期刊:
  • 影响因子:
    1.1
  • 作者:
    KAWAGUCHI Takahiko;KAWAI Takeshi;HIRAIWA Takuma;SAKAMOTO Naonori;SHINOZAKI Kazuo;SUZUKI Hisao;WAKIYA Naoki
  • 通讯作者:
    WAKIYA Naoki
Development of dynamic aurora pulsed laser deposition equipped with reflection high-energy electron diffraction and effects of magnetic fields on room-temperature epitaxial growth of NiO thin film
开发配备反射高能电子衍射的动态极光脉冲激光沉积和磁场对 NiO 薄膜室温外延生长的影响
  • DOI:
    10.2109/jcersj2.20215
  • 发表时间:
    2021
  • 期刊:
  • 影响因子:
    1.1
  • 作者:
    KAWAGUCHI Takahiko;YOSHIDA Mayu;SAKAMOTO Naonori;SHINOZAKI Kazuo;SUZUKI Hisao;WAKIYA Naoki
  • 通讯作者:
    WAKIYA Naoki
As-grown Mn<sub>3</sub>CuN thin films with high crystallinity prepared by dynamic aurora pulsed laser deposition
动态极光脉冲激光沉积制备高结晶度Mn<sub>3</sub>CuN薄膜
  • DOI:
    10.2109/jcersj2.20216
  • 发表时间:
    2021
  • 期刊:
  • 影响因子:
    1.1
  • 作者:
    KAWAGUCHI Takahiko;SUZUKI Jumpei;SAKAMOTO Naonori;SUZUKI Hisao;WAKIYA Naoki
  • 通讯作者:
    WAKIYA Naoki

SUZUKI Hisao的其他文献

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{{ truncateString('SUZUKI Hisao', 18)}}的其他基金

The education effects on an interactive sport educational activities in the Support Program for Contemporary Educational Needs.
教育对当代教育需求支持计划中互动体育教育活动的影响。
  • 批准号:
    20500520
  • 财政年份:
    2008
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
ANALYSIS OF PHASES OF SUPERSYMMETRYC YANG-MILLS THEORIES AND SUPERSTRINGS
超对称杨-米尔斯理论和超弦的相分析
  • 批准号:
    11640244
  • 财政年份:
    1999
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Preparation of Ceramic Composites with High Toughness by Low-temperature Sintering of Micro-hollow Sphere Particles
微空心球颗粒低温烧结制备高韧性陶瓷复合材料
  • 批准号:
    05805055
  • 财政年份:
    1993
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
Functional organization in the monkey frontal eye field particularly in the deep region of the anterior arcuate bank
猴子额眼区的功能组织,特别是前弓状岸的深层区域
  • 批准号:
    63570046
  • 财政年份:
    1988
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
Cerebral Mechanism of Visually Guided Eye Movements
视觉引导眼球运动的大脑机制
  • 批准号:
    60480113
  • 财政年份:
    1985
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)

相似海外基金

Development of phase shifter with ferroelectric thin film for adaptive device in microwave or millimeter wave band
微波毫米波自适应器件铁电薄膜移相器的研制
  • 批准号:
    17K14677
  • 财政年份:
    2017
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    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Young Scientists (B)
Fabrication and Characterization of the Transparent Pyroelectric Infrared Sensor Using Organic Ferroelectric Thin Film
有机铁电薄膜透明热释电红外传感器的制备与表征
  • 批准号:
    15K13817
  • 财政年份:
    2015
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
Time resolved and in-situ structural analysis of a ferroelectric thin film during polarization switching using synchrotron-based diffraction
使用同步加速器衍射对铁电薄膜偏振切换过程中的时间分辨和原位结构进行分析
  • 批准号:
    18310085
  • 财政年份:
    2006
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
SST - Ferroelectric Thin-Film Active Sensor Arrays for Structural Health Monitoring
SST - 用于结构健康监测的铁电薄膜有源传感器阵列
  • 批准号:
    0528873
  • 财政年份:
    2005
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Standard Grant
Development of Environmental-friendly Bi_4Ti_3O_<12>-based Ferroelectric Thin Film
环保型Bi_4Ti_3O_<12>基铁电薄膜的研制
  • 批准号:
    13555170
  • 财政年份:
    2001
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Proposal of new material for ferroelectric thin film memories and method to evaluate material properties.
提出铁电薄膜存储器新材料和评估材料性能的方法。
  • 批准号:
    12450266
  • 财政年份:
    2000
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    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Proposal of new material for ferroelectric thin film memories and method to evaluate material properties.
提出铁电薄膜存储器新材料和评估材料性能的方法。
  • 批准号:
    11555233
  • 财政年份:
    1999
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    $ 6.98万
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    Grant-in-Aid for Scientific Research (B)
Hoteroepitaxial growth of ferroelectric thin film on Si substrate by controlling the interface
控制界面在硅衬底上热外延生长铁电薄膜
  • 批准号:
    09450125
  • 财政年份:
    1997
  • 资助金额:
    $ 6.98万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
SBIR PHASE I: Self-Patterning Process for Conductive Oxide Contacts for Ferroelectric Thin Film Memory Devices
SBIR 第一阶段:铁电薄膜存储器件导电氧化物触点的自图案化工艺
  • 批准号:
    9561650
  • 财政年份:
    1996
  • 资助金额:
    $ 6.98万
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    Standard Grant
THE STUDY ON FERROELECTRIC THIN FILM MATERIALS FOR NON-VOLATILE MEMORY
非易失性存储器铁电薄膜材料的研究
  • 批准号:
    06650375
  • 财政年份:
    1994
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