Development of Environmental-friendly Bi_4Ti_3O_<12>-based Ferroelectric Thin Film
Development of Environmental-friendly Bi_4Ti_3O_<12>-based Ferroelectric Thin Film
批准号:
13555170
负责人:
FUNAKUBO Hiroshi
金额:
$5.82万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2002
中文摘要
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英文摘要
The purpose of the present research is the development of lead-free ferroelectric thin films. The obtained results are summarized as follows :1. By the substitution of the lanthanide elements of the Bi site in psudoperovskite of Bi_4Ti_3O_<12>, the ferroelectric properties of Bi_4Ti_3O_<12> was dramatically improved.2. Especially Nd doped one showed large remanent polarization above 35・C/cm^2, which was compatible to that of Pb(Zr_<0.5>Ti_<0.5>)O_3 films.3. Good ferroelectricity was observed for the La doped films even at 500oC, which is useful for the device applications
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Takayuki Watanabe: "Preparation and Characterization of a-and B-Axis-Oriented Epitaxially Grown Bi_4Ti_3O_<12>-Based Thin Films on Rutile-Type Oxides"Materials Research Society Proceedings. 688. 155-160 (2002)
Takayuki Watanabe:“金红石型氧化物上a轴和B轴取向外延生长的Bi_4Ti_3O_<12>基薄膜的制备和表征”材料研究学会论文集。
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通讯作者:
Takashi Kojima: "Ferroelectric Properties of Lanthanide-Substituted Bi_4Ti_3O_<12> Epitaxial Thin Films Grown by Metalorganic Chemical Vapor Deposition"Journal of Applied Physics. 93・4. 1707-1712 (2003)
小岛隆:“金属有机化学气相沉积生长的镧系元素取代的Bi_4Ti_3O_<12>外延薄膜的铁电性能”应用物理学杂志93・4(2003)。
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T.Watanabe, et al.: "Orientation of Bi_4Ti_3O_<12> based Ferroelectric Thin Film Prepared on Various Kinds of Substrates by Metalorganic Chemical Vapor Deposition"J. Crystal Growth. 235. 389-393 (2002)
T.Watanabe等:“通过金属有机化学气相沉积在各种基底上制备Bi_4Ti_3O_12基铁电薄膜的取向”J。
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Hiroshi Uchida: "Fabrication of V-Substituted (Bi,M)_4Ti_3O_<12>[M=Lanthanoids] Thin Films by Chemical Solution Deposition Method"Materials Research Society Proceedings. 688. C2.3.1.-C2.3.6. (2002)
Hiroshi Uchida:“通过化学溶液沉积法制备V-取代的(Bi,M)_4Ti_3O_<12>[M=镧系元素]薄膜”材料研究会论文集。
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Takashi Kojima: "Ferroelectric Properties of Lanthanide-Substituted Bi_4Ti_3O_<12> Epitaxial Thin Films Grown by Metalorganic Chemical Vapor Deposition"Journal of Applied Physics. 93・3. 1707-1712 (2003)
小岛隆:“金属有机化学气相沉积生长的镧系元素取代的 Bi_4Ti_3O_<12> 外延薄膜的铁电性能”应用物理学杂志 93・3(2003 年)。
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