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Magnetic Structural Analysis of Magnetic Thin Films Artificially Modulated on a Monatomic Layer scale by Polarized Neutron Scattering Technique

Magnetic Structural Analysis of Magnetic Thin Films Artificially Modulated on a Monatomic Layer scale by Polarized Neutron Scattering Technique
偏振中子散射技术单原子层尺度人工调制磁性薄膜的磁结构分析
批准号:
17310078
负责人:
TAKEDA Masayasu
金额:
$8.67万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2005
资助国家:
日本
项目状态:
已结题
起止时间:
2005 至 2007

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中文摘要
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英文摘要
1. Polarized neutron options for a triple-axis neutron spectrometer, TAS-1, and a neutron reflectometer, SUIREN, have been improved. The spectrometer and reflectometer are installed at research reactor JRR-3 of Japan Atomic Energy Agency (JAEA) and are now capable of the detailed magnetic structural analysis of the thin magnetic films whose scattering volumes are very tiny.2. Spherical polarization analysis of an artificially confined spin-density wave in Cr/Sn multilayer has been successfully given using combination of TAS-1 and CRYOPAD (CRYOgenic Polarization Analysis Device). CRYOPAD can measure the three components of the polarization of scattered neutrons, and consequently can determine complicated spin structures in antiferromagnetic specimen.3. Magnetic films synthesized by the investigators and the other collaborators have been investigated using TAS-1 and SUIREN. For example it has been revealed that no giant magnetic moment exists in α"-Fe_<16>N_2 thin films with an optimum nitrization using TAS-1. The giant magnetic moment in α"-Fe_<16>N_2 had been a long term issue.4. Deposition of Ruthenium (Ru) has been succeeded using the Knudsen Cell with the rate of 0.001nm/sec. at 1985 C. Ru is a key material for improvement of the performance of magnetic recoding read-head. The deposition using K cell had never been tried because of the high melting point of Ru although high-quality epitaxial growth was generally expected using the K cell. We are now going to the next step to synthesize high-quality epitaxial films using the K cell and the van der Waals epitaxy method.
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中性子反射率による磁性多層膜の磁気構造評価
利用中子反射率评估磁性多层膜的磁结构
DOI: --
发表时间: 2009
期刊: 日本磁気学会誌まぐね 4
影响因子: --
作者: [平野辰巳, 武田全康i]
通讯作者: 武田全康i
Buried H Monolayer at Hetero-Interface between Highly Mismatched Sr Films and Si Substrate
高度失配的 Sr 薄膜和 Si 衬底之间异质界面处的埋 H 单分子层
DOI: --
发表时间: 2008
期刊: Trans. Mater. Res. Soc. Jpn. 33
影响因子: --
作者: [T. Yamazaki, H. Asaoka, M. Takeda, D. Yamazaki, T. Taguchi, N. Torikai, Y. Toyoshima, S. Shamoto]
通讯作者: S. Shamoto
DOI: --
发表时间: 2006
期刊: KEK Progress Report 2006-3
影响因子: --
作者: [S. Ono, A. Oide, H. Asoh, Takeda M.]
通讯作者: Takeda M.
中性子反射率計(界面の情報を探る)
中子反射计(搜索接口信息)
DOI: --
发表时间: 2007
期刊:
影响因子: --
作者: [飯田康夫, 他, 武田全康]
通讯作者: 武田全康
39
    Three-dimensional internal structures in the permanent magnets extracted from small-angle neutron scattering patterns
    • 批准号:
      25390136
    • 项目类别:
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    • 资助金额:
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    • 财政年份:
      2013
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    • 财政年份:
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    • 资助金额:
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    • 财政年份:
      1994
    • 负责人:
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