Magnetic Structural Analysis of Magnetic Thin Films Artificially Modulated on a Monatomic Layer scale by Polarized Neutron Scattering Technique

偏振中子散射技术单原子层尺度人工调制磁性薄膜的磁结构分析

基本信息

  • 批准号:
    17310078
  • 负责人:
  • 金额:
    $ 8.67万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 财政年份:
    2005
  • 资助国家:
    日本
  • 起止时间:
    2005 至 2007
  • 项目状态:
    已结题

项目摘要

1. Polarized neutron options for a triple-axis neutron spectrometer, TAS-1, and a neutron reflectometer, SUIREN, have been improved. The spectrometer and reflectometer are installed at research reactor JRR-3 of Japan Atomic Energy Agency (JAEA) and are now capable of the detailed magnetic structural analysis of the thin magnetic films whose scattering volumes are very tiny.2. Spherical polarization analysis of an artificially confined spin-density wave in Cr/Sn multilayer has been successfully given using combination of TAS-1 and CRYOPAD (CRYOgenic Polarization Analysis Device). CRYOPAD can measure the three components of the polarization of scattered neutrons, and consequently can determine complicated spin structures in antiferromagnetic specimen.3. Magnetic films synthesized by the investigators and the other collaborators have been investigated using TAS-1 and SUIREN. For example it has been revealed that no giant magnetic moment exists in α"-Fe_<16>N_2 thin films with an optimum nitrization using TAS-1. The giant magnetic moment in α"-Fe_<16>N_2 had been a long term issue.4. Deposition of Ruthenium (Ru) has been succeeded using the Knudsen Cell with the rate of 0.001nm/sec. at 1985 C. Ru is a key material for improvement of the performance of magnetic recoding read-head. The deposition using K cell had never been tried because of the high melting point of Ru although high-quality epitaxial growth was generally expected using the K cell. We are now going to the next step to synthesize high-quality epitaxial films using the K cell and the van der Waals epitaxy method.
1. 三轴中子星光谱仪TAS-1和中子反射计SUIREN的极化中子选项得到了改进。该光谱仪和反射计安装在日本原子能机构(JAEA)的研究堆JRR-3上,能够对散射体积非常小的磁性薄膜进行详细的磁性结构分析。利用TAS-1和CRYOPAD (CRYOgenic polarization analysis Device)的组合,成功地对Cr/Sn多层膜中人工受限的自旋密度波进行了球面极化分析。CRYOPAD可以测量散射中子的三种极化分量,从而可以测定反铁磁样品中复杂的自旋结构。利用TAS-1和SUIREN对研究者和其他合作者合成的磁性薄膜进行了研究。例如,利用TAS-1发现在具有最佳硝化效果的α ' ' -Fe_<16>N_2薄膜中不存在巨磁矩。α′-Fe_<16>N_2中的巨磁矩是一个长期存在的问题。利用Knudsen电池成功沉积钌(Ru),沉积速率为0.001nm/sec。Ru是提高磁记录读头性能的关键材料。由于钌的熔点高,使用K电池沉积从未尝试过,尽管通常期望使用K电池进行高质量的外延生长。下一步,我们将利用K细胞和范德华外延法合成高质量的外延薄膜。

项目成果

期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
中性子反射率による磁性多層膜の磁気構造評価
利用中子反射率评估磁性多层膜的磁结构
Buried H Monolayer at Hetero-Interface between Highly Mismatched Sr Films and Si Substrate
高度失配的 Sr 薄膜和 Si 衬底之间异质界面处的埋 H 单分子层
  • DOI:
  • 发表时间:
    2008
  • 期刊:
  • 影响因子:
    0
  • 作者:
    T. Yamazaki;H. Asaoka;M. Takeda;D. Yamazaki;T. Taguchi;N. Torikai;Y. Toyoshima;S. Shamoto
  • 通讯作者:
    S. Shamoto
Analysis of Magnetic Structures and Magnetic Domain Distributions of Magnetic Thin Films by Polarized Neutron Reflectometer
偏振中子反射计分析磁性薄膜的磁结构和磁畴分布
  • DOI:
  • 发表时间:
    2006
  • 期刊:
  • 影响因子:
    0
  • 作者:
    S. Ono;A. Oide;H. Asoh;Takeda M.
  • 通讯作者:
    Takeda M.
中性子反射率計(界面の情報を探る)
中子反射计(搜索接口信息)
  • DOI:
  • 发表时间:
    2007
  • 期刊:
  • 影响因子:
    0
  • 作者:
    飯田康夫;他;武田全康
  • 通讯作者:
    武田全康
JRR-3新中性子反射率計SUIREN
JRR-3新型中子反射计SUIREN
  • DOI:
  • 发表时间:
    2006
  • 期刊:
  • 影响因子:
    0
  • 作者:
    山崎大;曽山和彦;武田全康;丸山龍治;海老沢徹;盛合敦;田村格良;中村清
  • 通讯作者:
    中村清
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TAKEDA Masayasu其他文献

TAKEDA Masayasu的其他文献

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{{ truncateString('TAKEDA Masayasu', 18)}}的其他基金

Three-dimensional internal structures in the permanent magnets extracted from small-angle neutron scattering patterns
从小角度中子散射图案中提取永磁体的三维内部结构
  • 批准号:
    25390136
  • 财政年份:
    2013
  • 资助金额:
    $ 8.67万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Controll and Quantitative Analysis of Spin Disorder at Magnetic fractal Interface
磁分形界面自旋无序的控制与定量分析
  • 批准号:
    12640330
  • 财政年份:
    2000
  • 资助金额:
    $ 8.67万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
Investigation of Surface and Interfacial Roughness in multilayrs by Neutron Reflectivity Measurements
通过中子反射率测量研究多层表面和界面粗糙度
  • 批准号:
    06640463
  • 财政年份:
    1994
  • 资助金额:
    $ 8.67万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)

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