Purification of sputtering target metals for high-k insulator films of MOSFET devices

MOSFET 器件高 k 绝缘膜溅射靶金属的纯化

• 批准号: 19360339
• 负责人: MIMURA Kouji
• 金额: $ 8.15万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2007
• 资助国家: 日本
• 起止时间: 2007 至 2009
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-19360339/
• 关键词: 高純度金属; 高純度精製; 水素プラズマ溶解; 帯溶融; ハフニウム; ジルコニウム; 希土類金属; チタン; 金属生産工学; 不純物強除去速度; プラズマ溶解精製; 水素プラズマ; 精製機構; 帯溶融精製; 活性水素; ランタン; セリウム; 水素プラズマ溶解精製

Purification of Hf, Zr, Ti, La and Ce, needed as the sputtering target metals for the advanced electronic devices, was examined by means of thermal plasma arc techniques. For purification of Hf, Zr and Ti, hydrogen plasma arc melting (HPAM) was used and, then, their high purity metals were obtained by the remarkable reduction of many volatile metallic impurities like Fe, Al, and Cu during HPAM under atmospheric pressure. On the other hand, for purification of La and Ce, plasma arc zone melting (PZM) was applied and, then, high purity both metals were prepared by the excellent segregation of several metallic impurities like Fe and Al and, furthermore, the vaporization reduction of volatile impurities like Ca and Mn during PZM of La and Ce rods.

采用热等离子体弧技术对先进电子器件溅射靶金属Hf、Zr、Ti、La、Ce的提纯进行了研究。为了提纯Hf、Zr和Ti，采用氢等离子体弧熔炼(HPAM)，然后在常压下HPAM过程中显著降低了Fe、Al、Cu等挥发性金属杂质，从而获得了高纯金属。另一方面，对于La和Ce的提纯，采用了等离子弧区熔法(PZM)，然后通过Fe和Al等金属杂质的良好偏析以及La和Ce棒PZM过程中挥发性杂质Ca和Mn的汽化还原，获得了高纯度的La和Ce。

项目成果

Refining and Purification of Rare Metals using Plasma Arc Heating

使用等离子弧加热精炼和提纯稀有金属

• 发表时间: 2008
• 作者: 三村耕司;一色実
• 通讯作者: 一色実

Refining and Purification of Rare Metals using Plasma Are Heating

使用等离子体加热精炼和提纯稀有金属

• 发表时间: 2008
• 作者: 三村耕司;一色実
• 通讯作者: 一色実

Purification of lanthanum and cerium by plasma arc zone melting

• DOI: 10.1007/s10853-008-2449-9
• 发表时间: 2008-02
• 期刊: Journal of Materials Science
• 影响因子: 4.5
• 作者: K. Mimura;Takanori Sato;M. Isshiki

Refining effect of hydrogen plasma arc melting on titanium sponges

• DOI: 10.1016/j.matlet.2009.11.033
• 发表时间: 2010-02
• 期刊: Materials Letters
• 影响因子: 3
• 作者: K. Mimura;Jaewon Lim;J. Oh;G. Choi;S. Cho;M. Uchikoshi;M. Isshiki

水素プラズマアーク溶解によるTi及びTi合金の精製

氢等离子弧熔炼钛及钛合金的净化

• 发表时间: 2009
• 作者: 三村耕司;J. W. Lim;G. S. Choi;一色実
• 通讯作者: 一色実