Investigation of VHF plasmas with narrow gap under high gas pressure for the fabrication of microcrystalline silicon thin films.

研究高气压下窄间隙甚高频等离子体用于微晶硅薄膜的制造。

• 批准号: 20560022
• 负责人: MUTA Hiroshi
• 金额: $ 3.16万
• 依托单位: Gifu University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2008
• 资助国家: 日本
• 起止时间: 2008 至 2010
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-20560022/
• 关键词: 薄膜シリコン太陽電池; VHFプラズマ; 高圧狭ギャップ; 微結晶シリコン; プラズマパラメータ; バラン給電法; 太陽電池

Characteristics of VHF plasmas with narrow gap under high gas pressure were experimentally and numerically investigated. Simultaneously, the suitable power feeding method-balanced power feed was proposed. The measurement results of the plasma parameters showed that the elctron density was a few times higher and the electron temperature was lower in the case of the balanced power feed. In addition, the simulation results indicated that the plasma potential was lower. As a result of preparation of the microcrystalline silicon thin films, it was considered that the balanced power feed is advantageous for high speed deposition and low ion damage.

对高气压下窄间隙甚高频等离子体的特性进行了实验和数值研究。同时提出了合适的供电方式——平衡供电。等离子体参数测量结果表明，平衡供电情况下，电子密度提高数倍，电子温度降低。此外，模拟结果表明等离子体电势较低。作为微晶硅薄膜制备的结果，认为平衡供电有利于高速沉积和低离子损伤。

项目成果

Observation of Negative Ions in VHF SiH_4/H_2 Plasma

VHF SiH_4/H_2 等离子体中负离子的观察

• 发表时间: 2010
• 作者: Y.Kawai;T.Yamane;Y. Takeuchi;Y.Yamauchi;H.Takatsuka;H.Muta;K.Uchino
• 通讯作者: K.Uchino

Investigation of Plasma Paramclers in a VHF Plasma with Narrow Gapunder High Gaseous Pressure

高气压下窄间隙甚高频等离子体中等离子体参数的研究

• 发表时间: 2009
• 期刊: Plasma Processes and Polymers 4(印刷中)
• 作者: H Muta;S;Kishida;M. Tanaka;Y. Yamauchi;T. Baba. Y. Takcuchi;H. Takatsuka. Y. Kawai
• 通讯作者: H. Takatsuka. Y. Kawai

バラン給電法によるVHFプラズマの特性

使用巴伦馈电方法的 VHF 等离子体的特性

• 发表时间: 2010
• 作者: 水野健太;松岡正典;牟田浩司;西田哲;栗林志頭眞;竹内良昭;山内康弘;高塚汎
• 通讯作者: 高塚汎

Analysis of Si Deposition Using Under-expanded Supersonic Jet in SiH_4/H_2 PE-CVD

SiH_4/H_2 PE-CVD中欠膨胀超音速射流硅沉积分析

• 发表时间: 2011
• 作者: S.Nishida;Y.Tsunekawa;M.Ukai;D.Ando;N.Okamoto;S.Tanaka;N.Tanaka;J.Nakamura;Y.Nomura;H.Muta;S.Kuribayashi
• 通讯作者: S.Kuribayashi

高圧狭ギャップVHFプラズマの数値シミュレーション

高压窄间隙VHF等离子体的数值模拟

• 发表时间: 2010
• 作者: 高比良将;丸尾幸一郎;牟田浩司;西田哲;栗林志頭眞
• 通讯作者: 栗林志頭眞