A study on the origin of localized states in Si thin films by photothermal bending spectroscopy

光热弯曲光谱研究硅薄膜局域态的起源

• 批准号: 20560294
• 负责人: YOSHIDA Norimitsu
• 金额: $ 3万
• 依托单位: Gifu University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2008
• 资助国家: 日本
• 起止时间: 2008 至 2010
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-20560294/
• 关键词: 電気・電子材料; 物性実験

The origin of an optical absorption observed at 1.4eV by photothermal bending spectroscopy in Si thin films prepared near the transition region of deposition conditions from amorphous Si to crystalline phase has been studied. From experimental results that the absorption decreases by light illumination, it is concluded that the origin of the absorption could be Si crystallites with a grain size under 4nm.

用光热弯曲光谱研究了在非晶态硅向晶态硅沉积条件过渡区附近制备的硅薄膜在1.4 eV处的光吸收的来源。根据光吸收降低的实验结果，推测吸收的来源可能是粒径在4 nm以下的硅微晶。

项目成果

A study of absorption coefficient spectra in a-Si H films near the transition from amor phous to crystalline phase measured by resonant photothermal bending speetroscopy

共振光热弯曲光谱法研究a-Si H薄膜非晶态向晶态转变附近的吸收系数光谱

• 发表时间: 2008
• 期刊: Journal of Non-Crystalline Solids 354
• 作者: 山口浩一;角田直輝;海津利行;高橋正光;藤川誠司;山下馨;池田正則,清水博文,高松弘行,迫田尚和;Norimitsu Yoshida
• 通讯作者: Norimitsu Yoshida

Preparations of P-and N-doped hydrogenated microcrystalline cubic silicon carbide films by VHF plasma enhanced chemical vapor deposition method for Si thin film solar cells

VHF等离子体增强化学气相沉积法制备P、N掺杂氢化微晶立方碳化硅薄膜用于硅薄膜太阳能电池

• 发表时间: 2010
• 期刊: Physica Status Solidi (c) Vol.7, No.3-4
• 作者: Norimitsu Yoshida;Sho Terazawa;Atsuteru Takeuchi;Nobutaka Yoneyama;Tomo-o Morino;Zhao Jun;Hironori Natsuhara;Shuichi Nonomura
• 通讯作者: Shuichi Nonomura

Preparations of P- and N-doped hydrogenated microcrystalline cubic silicon carbide films by VHF plasma enhanced chemical vapor deposition method for Si thin film solar cells

VHF等离子体增强化学气相沉积法制备P、N掺杂氢化微晶立方碳化硅薄膜用于硅薄膜太阳能电池

• 发表时间: 2010
• 期刊: Physica Status Solidi (c)
• 作者: Norimitsu Yoshida;Sho Terazawa;Atsuteru Takeuchi;Nobutaka Yoneyama;Tomo-o Morino;Zhao Jun;Hironori Natsuhara;Shuichi Nonomura
• 通讯作者: Shuichi Nonomura

A study of absorption coefficient spectra in a-Si:H films near the transition from amorphous to crystalline phase measured by resonant photothermal bending spectroscopy

• DOI: 10.1016/j.jnoncrysol.2007.10.039
• 发表时间: 2008-05
• 期刊: Journal of Non-crystalline Solids
• 影响因子: 3.5
• 作者: N. Yoshida;Y. Shimizu;T. Honda;Toshiaki Yokoi;S. Nonomura

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