A Versatile High-resolution X-ray Diffractometer for Materials Research

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The aim of this project is to establish a state-of-the-art triple-axis x-ray diffraction facility capable of non-destructively analysing complex semiconductor materials and structures investigated by all Australian semiconductor-growing groups. Growers and device engineers will be able to control growth processes accurately and correlate device performance with structural analysis. Modern triple-axis instruments can also be used for high-resolution texture analysis and surface reflectivity measurements on numerous types of materials. Thus chemists, geologists, and materials scientists with interests outside of the semiconductor growth community will gain substantial benefit from this instrument for the investigation of materials of technological and economic importance.