Crystal growth mechanism of SiC under metastable equilibrium

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Metastable Solvent Epixaty, MSE, is the cheep and stable process of 4H-SiC, which has been expected to be a next generation power device materials. For clarify this novel process, first principles calculations has been performed. Phonon calculations suggest the stability of 4H-SiC. Surface energy calculations shows that the (0001) surface is the most stable in Si-rich environment. Low activation energy of surface diffusion on (0001) C-face drives the flat growth of this surface.