Magneto-surface-plasmon resonance effect and u l tra fast magneticsensing

磁表面等离子体共振效应和超快磁传感

• 批准号: 22760304
• 负责人: ASHIZAYA Yoshito
• 金额: $ 2.58万
• 依托单位: Nihon University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2010
• 资助国家: 日本
• 起止时间: 2010 至 2011
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-22760304/
• 关键词: センシングデバイス; 表面プラズモン; 光物性; スピンエレクトロニクス; 電子・電気材料; 磁気記録

Higher recording density and higher speed recording are required for magnetic recording in information storage field, high density writing/reading and high speed writing techniques have been studied in the world. High speed reading technique will be a key issue for development of high speed recording techniques because of its physical limit of ferromagnetic resonance frequency. In this research, surface plasmon was investigated to be applied to magnetic sensing techniques for ultra揺igh reading sensor. Magnetic response of surface plasmon was observed in Co/Cu multilayer films, which films were composed by a surface plasmon generation layer and a controlling layer magnetically. Furthermore, Direction dependence of applied field on surface plasmon generation was observed.

Higher recording density and higher speed recording are required for magnetic recording in information storage field, high density writing/reading and high speed writing techniques have been studied in the world. High speed reading technique will be a key issue for development of high speed recording techniques because of its physical limit of ferromagnetic resonance frequency. In this research, surface plasmon was investigated to be applied to magnetic sensing techniques for ultrahigh reading sensor. Magnetic response of surface plasmon was observed in Co/Cu multilayer films, which films were composed by a surface plasmon generation layer and a controlling layer magnetically. Furthermore, Direction dependence of applied field on surface plasmon generation was observed.

项目成果

Dependence of Magnetic Response of Surface Plasmon Resonance on Applied Field Direction

表面等离子共振的磁响应对施加场方向的依赖性

• 发表时间: 2011
• 作者: Y. Ashizawa;S. Shinohara;T;Nawata;and K. Nakagawa
• 通讯作者: and K. Nakagawa

Surface Plasmon Resonance in Co/Cu Sputtering films

Co/Cu 溅射薄膜中的表面等离子共振

• 发表时间: 2010
• 作者: Yoshi to Ashizawa;Takeshi Nawata;Shusaku Shinohara;and Katsuji Nakagawa
• 通讯作者: and Katsuji Nakagawa