Study on the mechanism of the sputtering deposition process and preparation of the new functional thin films

溅射沉积工艺机理研究及新型功能薄膜的制备

• 批准号: 23340181
• 负责人: KAWASAKI Hiroharu
• 金额: $ 6.24万
• 依托单位: Sasebo National College of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2011
• 资助国家: 日本
• 起止时间: 2011 至 2013
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23340181/
• 关键词: スパッタリング; 粉体ターゲット; スパッタリング成膜; 機能性薄膜; プラズマプロセス; 電気電子材料

Functional thin films were prepared using sputtering deposition with powder target. Their deposition processes were also studied by Langmuir probe method, light emission spectroscopic method and laser light scattering method. Experimental results suggest that film quality using powder target were almost same compared with that using bulk target. However, deposition rate using powder target were 2~5 times higher than that using bulk target. Electron density and Ti emission intensity of the sputtering deposition methods were also 2~5 times higher than that using bulk target. The high electron density using powder target may be due to the 4 reasons as follows. 1)Net surface area of the target is larger than that of the bulk target. 2) Oblique incidence of sputtering ions into the target. 3)Surface temperature of the powder target is higher than that of the bulk target. 4)Hollow cathode effects in the target.

采用粉末靶溅射沉积法制备了功能薄膜。用朗缪尔探针法、光发射光谱法和激光光散射法研究了它们的沉积过程。实验结果表明，用粉末靶和块状靶制备的薄膜质量基本相同。而粉末靶的沉积速率比块状靶高2~5倍。溅射沉积的电子密度和Ti发射强度也比体靶高2~5倍。采用粉末靶的高电子密度可能是由于以下4个原因。1)靶的净表面积大于块状靶的净表面积。2)溅射离子斜入射到靶中。3)粉末靶的表面温度高于块状靶。4)靶中的空心阴极效应。

项目成果

PLD法により作製したAZO薄膜の特性改善

PLD法制备AZO薄膜性能的改善

• 发表时间: 2012
• 作者: 鈴木大介;渡邉昇;高橋正彦;坂本章;大島多美子
• 通讯作者: 大島多美子

Two dimensional images of the multi electrodes gliding arc discharge

多电极滑动电弧放电的二维图像

• 发表时间: 2012
• 作者: H. Kawasaki;T. Ohshima;T. Ihara;Y. Yagyu;Y. Suda;S. Aoqui;T. Kawasaki;F. Mitsugi;Y. Tajima;T. Baba;Y. Takeuchi
• 通讯作者: Y. Takeuchi

単相グライディングアーク放電と三相グライディングアーク放電に関する研究

单相滑移电弧放电和三相滑移电弧放电研究

• 发表时间: 2011
• 作者: H. Hoshino;Y. Yamakita;Y. Suzuki;M. Saito;K. Koyasu;and F. Misaizu;鈴木暁彦,坂本章;T. Nagata;高橋まさえ;A.Lyalin;村本郁矢
• 通讯作者: 村本郁矢

Discharge characteristics in liquid helium, liquid nitrogen and pure water preparatory to fabrication of carbon nanomaterials

制备碳纳米材料的液氦、液氮和纯水中的放电特性

• DOI: 10.1088/1742-6596/400/5/052010
• 发表时间: 2012
• 期刊: Journal of Physics: Conference Series
• 作者: A. Mori;S. Murata;T. Hirata;Y. Kudo;M. Iwashita;Hiroharu Kawasaki
• 通讯作者: Hiroharu Kawasaki

Optical study of the low discharge power magnetron sputtering plasma using pure tungsten target

纯钨靶材低放电功率磁控溅射等离子体的光学研究

• 发表时间: 2010
• 期刊: Jpn.J.Appl.Phys.
• 作者: T.Matsunaga;T.Ohshima;H.Kawasaki;T.Kaneko;Y.Yagyu;Y.Suda
• 通讯作者: Y.Suda