Cylinder rod surface coating using sputtering deposition method with modulated magnetic field
Cylinder rod surface coating using sputtering deposition method with modulated magnetic field
批准号:
20340164
负责人:
KAWASAKI Hiroharu
金额:
$6.99万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2010
中文摘要
采用新型磁控溅射沉积方法在硬质合金钢质气缸杆上制备了钨、碳和钛薄膜,以防止其腐蚀和/或提高摩擦阻力。在沉积过程中,柱状杆阳极衬底和圆柱状管靶之间产生了等离子体。实验结果表明,在低频交变线圈电流调制磁场的作用下,等离子体密度分布向轴向移动。利用调制磁场提高了沉积速度和膜层的均匀性,提高了涂层的耐蚀性和耐磨性。
英文摘要
Tungsten, carbon and titanium thin films were prepared on the carbide steel cylinder rod using new magnetron sputtering deposition method to prevent their corrosion and/or increasing friction resistance. In the deposition, plasmas were generated between cylinder rod anode substrate and cylinder pipe targets. Experimental results suggest that plasma density distribution move to the axial direction using modulated magnetic field generated by low frequency alternating coil current. Deposition rate and film uniformity increased using modulated magnetic field, and corrosion resistance and friction resistance were increased by this hard coating.
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射频等离子体治疗消除过敏物质的研究
DOI:
--
发表时间:
2010
期刊:
Transactions of the Materials Research Society of Japan
影响因子:
--
作者:
[Y.Yagyu, A.Hikita, N.Hayashi, H. Kawasaki, T.Ohshima, Y.Suda]
通讯作者:
Y.Suda
Optical study of the low discharge power magnetron sputtering plasma using pure tungsten target
纯钨靶材低放电功率磁控溅射等离子体的光学研究
DOI:
--
发表时间:
2010
期刊:
Jpn.J.Appl.Phys.
影响因子:
--
作者:
[T.Matsunaga, T.Ohshima, H.Kawasaki, T.Kaneko, Y.Yagyu, Y.Suda]
通讯作者:
Y.Suda
Study on the behavior of the Plasma Plume and Film Quality using Pulsed Laser Deposition with Tungsten Target
钨靶脉冲激光沉积等离子体羽流行为和薄膜质量研究
DOI:
--
发表时间:
2009
期刊:
Trasactions of the Materials Research Society of Japan Vol.34(In press)
影响因子:
--
作者:
[H.Kawasaki, T.Ohshima, Y.Yagyu, Y.Suda]
通讯作者:
Y.Suda
レーザーアブレーション法によるAlドープ酸化亜鉛薄膜の作製
激光烧蚀法制备Al掺杂氧化锌薄膜
DOI:
--
发表时间:
2010
期刊:
影响因子:
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作者:
[T. Mori, K. Notsu, 村上雄紀]
通讯作者:
村上雄紀
Influence of Calcium Hydroxide Solution in RF Plasma on Sterilization of Bacterial Spores
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DOI:
--
发表时间:
2009
期刊:
J.Plasma Fusion Res.SERIES Vol.8
影响因子:
--
作者:
[W.Guan, H.Kawasaki, T.Ohshima, Y.Yagyu, T.Shigematsu, Y.Suda]
通讯作者:
Y.Suda
共 55 条
Study on the mechanism of the sputtering deposition process and preparation of the new functional thin films
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批准号:23340181
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$6.24万
-
财政年份:2011
-
负责人:KAWASAKI Hiroharu
-
依托单位:
Control of generation, growth, and behavior of particles in ablation plasma plume by electrmagnie field
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批准号:11558054
-
项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$3.65万
-
财政年份:1999
-
负责人:KAWASAKI Hiroharu
-
依托单位:
海外基金