Establishment of high efficient abrasive technique with mechanochemical superabrasive stone for next-generation

在前期的研究中，我们研制了一种含CeO2的机械力化学超硬磨料CBN/CeO2石材。此外，与CBN石材相比，这种石材产生的亚表面损伤更少，压缩残余应力更小。在本研究中，通过几种机械力化学超磨料石材的超抛光，尝试了硅或蓝宝石作为新的衬底材料的超平坦化。结果表明，这种超精加工的表面粗糙度与传统研磨大致相当，硅只需3分钟，蓝宝石只需15分钟。另一方面，完成了之前研究的CBN/CeO2石材的形貌模型的构建。

In the previous study, cBN/CeO2 stone, which is a type of mechanochemical superabrasive stone containing CeO2, was developed. Moreover, it was made clear that this stone produced less subsurface damage and smaller compressive residual stress than cBN stone.In this study, the super planarization of silicon or sapphire as new substrate material was tried through superfinishing with several mechanochemical superabrasive stones. As a result, the surface roughness of each work by this superfinishing was approximately equal to that by conventional lapping and was produced in 3 minutes for silicon or 15 minutes for sapphire. On the other hand, the construction of the topography model of cBN/CeO2 stone, which was a subject of the previous study, was completed.