Fundamental study on optimization of nanocarbon materials fabrication technique using an atmospheric-pressure plasma-assisted chemical vapor deposition
Fundamental study on optimization of nanocarbon materials fabrication technique using an atmospheric-pressure plasma-assisted chemical vapor deposition
批准号:
23560325
负责人:
ODA Akinori
金额:
$3.33万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2013
中文摘要
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英文摘要
In this research project, numerical simulation of non-thermal atmospheric-pressure hydrocarbon plasmas has been conducted using a one-dimensional fluid model, in order to examine whether volumetric and radially-uniform atmospheric-pressure plasmas can be obtained. Usually, hydrocarbon plasmas at low-pressure can be utilized for the fabrication of nanocarbon materials such as diamond-like carbon, diamond, graphene, carbon nanotube, etc. As a result, it is clarified that the volumetric and radially-uniform plasmas at atmospheric-pressure hydrocarbon gas, which are suitable for novel technique of plasma CVD, can not be produced, since electron multiplication, which is important factor for plasma generation, tends to increase rapidly under atmospheric-pressure hydrocarbon condition. Therefore, we need to further investigation on this project, in order to overcome this problem.
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Numerical Analysis on Substrate-Incident Carbon Flux in Low-Pressure Radio-Frequency CH<sub>4</sub> Plasmas for Deposition of Diamond-Like Carbon Films
低压射频CH<sub>4</sub>等离子体中基体入射碳通量沉积类金刚石碳膜的数值分析
DOI:
10.1541/ieejfms.134.53
发表时间:
2014
期刊:
IEEJ Transactions on Fundamentals and Materials
影响因子:
--
作者:
[相星亮, 山村直紀, 石田宗秋, 横水康伸,目黒佳一, 松村年郎., 金森泰樹,山村直紀,石田宗秋, 小西弘純・関川純哉, 横水康伸,目黒佳一,早瀬哲央,松村年郎., 小田昭紀,上坂裕之]
通讯作者:
小田昭紀,上坂裕之
Numerical Simulation on Fundamental Properties in Low-Pressure Radio- Frequency CH_4 Plasmas for Diamond-Like Carbon Films
低压射频CH_4等离子体中类金刚石碳薄膜基本性能的数值模拟
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[百々直輝, 山村直紀, 石田宗秋, A. Oda and H. Kousaka]
通讯作者:
A. Oda and H. Kousaka
千葉工業大学・小田昭紀研究室の紹介ページ
千叶工业大学小田昭典实验室介绍页
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
ダイヤモンドライクカーボン成膜用高周波CH4プラズマのシミュレーション
高频CH4等离子体模拟类金刚石碳膜沉积
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[Y. Yokomizu, Y. Meguro and T. Matsumura., 百々直輝,山村直紀,石田宗秋, 小田 昭紀,上坂 裕之]
通讯作者:
小田 昭紀,上坂 裕之
現代 電気電子材料
现代电气电子材料
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[Tomonori Tsuburaya, Yoshifumi Okamoto, Koji Fujisawa and Shuji Sato, 百々直輝,山村直紀,石田宗秋, 山本秀和,小田昭紀]
通讯作者:
山本秀和,小田昭紀
共 7 条
Fundamental Study on Research and Development of Diamond-Like Carbon Coating Technique using Atmospheric-Pressure Hydrocarbon Plasma-assisted Chemical Vapor Deposition
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批准号:26420247
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.24万
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财政年份:2014
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负责人:ODA Akinori
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依托单位: