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Fundamental study on optimization of nanocarbon materials fabrication technique using an atmospheric-pressure plasma-assisted chemical vapor deposition

Fundamental study on optimization of nanocarbon materials fabrication technique using an atmospheric-pressure plasma-assisted chemical vapor deposition
大气压等离子体辅助化学气相沉积纳米碳材料制备技术优化的基础研究
批准号:
23560325
负责人:
ODA Akinori
金额:
$3.33万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2013

项目摘要

项目成果

ODA Akinori的其他基金

相关文献

中文摘要
翻译
在本研究项目中,为了检验能否获得体积和径向均匀的大气压等离子体,采用一维流体模型对非热大气压碳氢等离子体进行了数值模拟。通常,低气压下的碳氢等离子体可用于制备类金刚石、金刚石、石墨烯、碳纳米管等纳米碳材料,结果表明,在常压碳氢气体中不能产生适合于等离子体CVD新技术的体积和径向均匀的等离子体,这是因为作为等离子体产生的重要因素,电子倍增在常压碳氢条件下往往会迅速增加。因此,我们需要对这一项目进行进一步的研究,以克服这一问题。
英文摘要
In this research project, numerical simulation of non-thermal atmospheric-pressure hydrocarbon plasmas has been conducted using a one-dimensional fluid model, in order to examine whether volumetric and radially-uniform atmospheric-pressure plasmas can be obtained. Usually, hydrocarbon plasmas at low-pressure can be utilized for the fabrication of nanocarbon materials such as diamond-like carbon, diamond, graphene, carbon nanotube, etc. As a result, it is clarified that the volumetric and radially-uniform plasmas at atmospheric-pressure hydrocarbon gas, which are suitable for novel technique of plasma CVD, can not be produced, since electron multiplication, which is important factor for plasma generation, tends to increase rapidly under atmospheric-pressure hydrocarbon condition. Therefore, we need to further investigation on this project, in order to overcome this problem.
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会议论文
Numerical Analysis on Substrate-Incident Carbon Flux in Low-Pressure Radio-Frequency CH<sub>4</sub> Plasmas for Deposition of Diamond-Like Carbon Films
低压射频CH<sub>4</sub>等离子体中基体入射碳通量沉积类金刚石碳膜的数值分析
DOI: 10.1541/ieejfms.134.53
发表时间: 2014
期刊: IEEJ Transactions on Fundamentals and Materials
影响因子: --
作者: [相星亮, 山村直紀, 石田宗秋, 横水康伸,目黒佳一, 松村年郎., 金森泰樹,山村直紀,石田宗秋, 小西弘純・関川純哉, 横水康伸,目黒佳一,早瀬哲央,松村年郎., 小田昭紀,上坂裕之]
通讯作者: 小田昭紀,上坂裕之
Numerical Simulation on Fundamental Properties in Low-Pressure Radio- Frequency CH_4 Plasmas for Diamond-Like Carbon Films
低压射频CH_4等离子体中类金刚石碳薄膜基本性能的数值模拟
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [百々直輝, 山村直紀, 石田宗秋, A. Oda and H. Kousaka]
通讯作者: A. Oda and H. Kousaka
千葉工業大学・小田昭紀研究室の紹介ページ
千叶工业大学小田昭典实验室介绍页
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
DOI: --
发表时间: 2012
期刊:
影响因子: --
作者: [Y. Yokomizu, Y. Meguro and T. Matsumura., 百々直輝,山村直紀,石田宗秋, 小田 昭紀,上坂 裕之]
通讯作者: 小田 昭紀,上坂 裕之
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    Fundamental Study on Research and Development of Diamond-Like Carbon Coating Technique using Atmospheric-Pressure Hydrocarbon Plasma-assisted Chemical Vapor Deposition
    • 批准号:
      26420247
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $3.24万
    • 财政年份:
      2014
    • 负责人:
      ODA Akinori
    • 依托单位: