Investigation of crystalline orientation of III-nitride semiconductors grown on high-index and non-polar oriented GaAs substrates
Investigation of crystalline orientation of III-nitride semiconductors grown on high-index and non-polar oriented GaAs substrates
批准号:
23760008
负责人:
MURAKAMI Hisashi
金额:
$2.58万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2012
中文摘要
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英文摘要
In this research, investigation of semi-polar nitride semiconductor growth on GaAs substrates with various orientations was carried out. For fiscal 23rd, growth of semi-polar InN on GaAs(113)A, (113)B and non-polar (110) surfaces, and epitaxial relationship between InN and GaAs and mechanism for suppression of twin crystal formation were clarified. Also, for fiscal 24th, InN growth on GaAs substrates of other indices such as (112)A, (112)B, (114)A and (114)B was studied.Consequently, as we expected, [0001] direction of InN tended to be parallel to [111] direction of GaAs when the growth temperature is relatively high. As a result, we succeeded to grow semi-polar InN of various crystal orientations by selecting the index (orientation) of GaAs substrate. (For example, {10-13}-oriented and {11-22}-oriented InN can be grown on GaAs(110) and (113)B, respectively.) Also, it is possible to suppress the twin crystal formation into the grown crystal by using the difference in thermal stability between In-polarity and N-polarity InN, and by the introduction of small amount of hydrogen into the carrier gas during the growth.
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GaN自立基板上InNハイドライド気相成長における基板極性の影響
衬底极性对 GaN 自支撑衬底上 InN 氢化物气相生长的影响
DOI:
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--
作者:
[Naoto Fujita, Ryota Imai, Rie Togashi, Hisashi Murakami, Yoshinao Kumagai, and Akinori Koukitu, 藤井努,石山武,石井佑弥,福田光男, 尾崎信彦, K. Tadaand M. Onoda, 富樫理恵]
通讯作者:
富樫理恵
バルクPVT基板上HVPE成長によるAlN自立基板の作製
在块状 PVT 基板上通过 HVPE 生长制造 AlN 自支撑基板
DOI:
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影响因子:
--
作者:
[Takeshi Ishiyama, Tsutomu Fujii, Yuya Ishii, Mitsuo Fukuda, 坂巻龍之介]
通讯作者:
坂巻龍之介
Influence of source gas supply sequence on hydride vapor phase epitaxy of AlN on (0001) sapphire substrates
源气供应顺序对(0001)蓝宝石衬底上AlN氢化物气相外延的影响
DOI:
10.1016/j.jcrysgro.2011.10.014
发表时间:
2012
期刊:
Journal of Crystal Growth
影响因子:
1.8
作者:
[Rie Togashi, Toru Nagashima, Manabu Harada, Hisashi Murakami, Yoshinao Kumagai, Hiroyuki Yanagi, Akinori Koukitu]
通讯作者:
Akinori Koukitu
Two-Step Growth of (0001) ZnO Single-Crystal Layers on (0001) Sapphire Substrates by Halide Vapor Phase Epitaxy
(0001)蓝宝石衬底上卤化物气相外延两步生长(0001)ZnO单晶层
DOI:
10.1143/jjap.50.125503
发表时间:
2011
期刊:
Japanese Journal of Applied Physics
影响因子:
1.5
作者:
[Rui Masuda, Rie Togashi, Hisashi Murakami, Yoshinao Kumagai, Akinori Kouikitu]
通讯作者:
Akinori Kouikitu
纐纈明伯,HVPE法を用いたsapphire(0001)基板上InN成長におけるNH3供給分圧依存性
Akihaku Kokei,使用 HVPE 方法在蓝宝石 (0001) 衬底上生长 InN 时的 NH3 供应分压依赖性
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[藤田静雄, 東脇正高,佐々木公平,倉又朗人,増井建和,山腰茂伸,大島孝仁,大友明, 藤村侑,村上尚,熊谷義直,纐纈明伯, 向井章,中園敦巳,大島孝仁,大友明, 富樫理恵,山本翔,K.F.Karlsson,村上尚,熊谷義直,P.O.Holtz]
通讯作者:
富樫理恵,山本翔,K.F.Karlsson,村上尚,熊谷義直,P.O.Holtz
共 67 条
Improvements in crystalline quality of InN for the realization of P-type doping by using a growth mode control
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批准号:20760010
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项目类别:Grant-in-Aid for Young Scientists (B)
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资助金额:$2.66万
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财政年份:2008
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负责人:MURAKAMI Hisashi
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依托单位:
海外基金