Elucidation of mechanism of photo-crystal growth in chemical solution deposition method based on nano second temperature measurement under pulsed UV laser irradiation

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In the excimer laser-assisted metal organic deposition (ELAMOD), a surface temperature rise at a few tens of nanoseconds upon the irradiation of pulsed UV laser is the key to the low temperature fabrication process of oxide thin films. In order to understand this photo-thermal process quantitatively, we have developed a novel system utilizing near-infrared sensors that can detect thermal emission signals from the irradiated surfaces. Utilization of plateau, which was observed in the emission signal history, enables the conversion of emission signal intensities into temperatures. This method enables us quantitative analysis of photo-thermal process of photo crystal growth in the ELAMOD process, and is also useful as a monitoring tool for excimer laser processing, which will expand the ability of ELAMOD process into flexible and printable electronics.