A New Reactive Sputtering Using Square Wave Reactant Gas Flow

利用方波反应气流的新型反应溅射

• 批准号: 09650729
• 负责人: HONDA Takuya
• 金额: $ 2.24万
• 依托单位: Japan Advanced Institute of Science and Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1998
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09650729/
• 关键词: Square Wave; Reactant Gas; Sputtering; DLC; Thin Films; 反応

The aim of this research is the development of a new reactive sputtering system with high efficiency and controllability utilizing non-linearity of chemical reactions. The experimental method is one of the modulation where an additional reactant gas flow is modulated as a square wave form onto the sputter-supporting gas. This process reduces the poisoning effects on target by reactive gases and promotes the deposition rate and controllability of the process.In 1997, titanium nitride was deposited on stainless steel substrate. The deposition rates showed 10-20 % increase and depends greatly on the reaction order of the deposition. This results indicates possibility of a new kinetic analysis.In 1998, diamondilke carbon (DLC) films were deposited on Fe substrates through two medium layers which have two different compositions like functionally gradient materials (FGM). DLC films are already produced on market, but stronger stickiness is desired for higher speed and more smooth surface for cutting tool. FGM-like coating promises stronger resistivity to thermal stress. We found out the experimental conditions for fine control of deposition composition, produced the three-layer coated substrates, and observed the composition profiles.

本研究的目的是利用化学反应的非线性特性，开发一种具有高效率和可控性的新型反应溅射系统。该实验方法是一种调制，其中一个额外的反应气体流调制为方波形式的催化剂支持气体。该工艺减少了反应气体对靶材的毒害作用，提高了沉积速率和工艺可控性。1997年，在不锈钢衬底上沉积出氮化钛。沉积速率增加了10- 20%，并且在很大程度上取决于沉积的反应级数。1998年，我们在Fe基体上通过两层不同成分的介质层沉积了类似梯度功能材料（FGM）的金刚石碳（DLC）薄膜。目前市场上已生产出DLC膜，但要求DLC膜具有较强的粘性，以提高刀具的切削速度和表面光洁度。FGM类涂层具有较强的抗热应力能力。找到了控制沉积成分的实验条件，制备了三层镀膜基板，并观察了成分分布。