A New Reactive Sputtering Using Square Wave Reactant Gas Flow
A New Reactive Sputtering Using Square Wave Reactant Gas Flow
批准号:
09650729
负责人:
HONDA Takuya
金额:
$2.24万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
本研究的目的是利用化学反应的非线性,开发一种高效、可控的新型反应溅射系统。实验方法是一种调制方法,将附加的反应物气流以方波的形式调制到支持溅射的气体上。该工艺减少了反应气体对靶材的毒害作用,提高了沉积速度和工艺的可控性。1997年,在不锈钢衬底上沉积了氮化钛。沉积速率提高了10-20%,并与沉积反应级数有很大关系。这一结果表明了一种新的动力学分析的可能性。1998年,通过具有两种不同组成的两种不同成分的功能梯度材料(FGM),在铁衬底上沉积了金刚石碳(DLC)薄膜。目前市场上已有DLC薄膜的生产,但对于高速、光滑的刀具表面,要求有更强的粘附性。类功能梯度材料涂层具有更强的抗热应力能力。摸索出了精细控制沉积成分的实验条件,制备了三层涂层基片,并观察了其成分分布。
英文摘要
The aim of this research is the development of a new reactive sputtering system with high efficiency and controllability utilizing non-linearity of chemical reactions. The experimental method is one of the modulation where an additional reactant gas flow is modulated as a square wave form onto the sputter-supporting gas. This process reduces the poisoning effects on target by reactive gases and promotes the deposition rate and controllability of the process.In 1997, titanium nitride was deposited on stainless steel substrate. The deposition rates showed 10-20 % increase and depends greatly on the reaction order of the deposition. This results indicates possibility of a new kinetic analysis.In 1998, diamondilke carbon (DLC) films were deposited on Fe substrates through two medium layers which have two different compositions like functionally gradient materials (FGM). DLC films are already produced on market, but stronger stickiness is desired for higher speed and more smooth surface for cutting tool. FGM-like coating promises stronger resistivity to thermal stress. We found out the experimental conditions for fine control of deposition composition, produced the three-layer coated substrates, and observed the composition profiles.
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Progress of Globalization in Higher Education
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批准号:17530610
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.86万
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财政年份:2005
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负责人:HONDA Takuya
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依托单位:
Development of Equipment Generating Ultra-fine particle for Functionally Gradient Materials.
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批准号:02453110
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.42万
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财政年份:1990
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负责人:HONDA Takuya
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依托单位: