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The Role of defects which play in the process of functional degradation in environmental resisting properties of ceramic coatings

功能退化过程中缺陷对陶瓷涂层耐环境性能的影响

基本信息

批准号：
09450053
负责人：
KIMURA Yuji
金额：
$ 5.89万
依托单位：
Kogakuin UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
1997
资助国家：
日本
起止时间：
1997 至 1998
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09450053/
关键词：
coated TiN thin film Plasma CVD and DIM method initial stages of localized corrosion E-AFM in-situ observation defect ratio type of defects mixing layer electrohemical measurement CVD,IMコーティング AFM観察

项目摘要

Thin film coatings toward various types of materials have been used for protecting substrate surface from corrosion damages or adding a lot of functions to them. Till now the studies have been mainly conducted concerning mechanical and chemical properties of TiN thin film coating. Therefore in this study, basic properties such as corrosion-resisting characteristics of CVD and PVD coatings were investigated from the viewpoint of defect in coated layer and adhesion properties between coating and substrate. The roles of defects, which play in the process of functional degradation in environment resistant characteristics of coatings, were examined. And then, improvement in these characteristics of coatings by making better the adhesion state between coating and substrate is investigated.Results obtained are summarized as follows ;(1) Extremely initial stages of localized corrosion process in coated TiN thin film in 3%NaCl aqueous solution was investigated by detailed mum or urn orders observations using Atomic Force Microscope (AFM). As a result, it was observed that correlation between localized corrosion morphologies and type of defects. Moreover, crevice corrosion characteristics were controlled by the adhesion properties between thin film and substrate was recognized.(2) TiN thin film coatings used in this study were made by two different types of coating methods, that is, Plasma CVD and Dynamic Ion Mixing (DIM) method. Then, defect morphology and the initial stage of localized corrosion morphology of urn or mum orders in 3% NaCl aqueous solution was investigated by Atomic Force Microscope (AEM). As a result, difference in the types of defects and localized corrosion morphologies were dearly observed depending upon the coating methods.(3) Electrochemical AFM in-situ observation of the types of defects and initial localized corrosion process on TiN thin film made by different coating methods can be conducted under various electrochemically controlled conditions.

各种类型材料的薄膜涂层已被用于保护基底表面免受腐蚀损伤或增加许多功能。目前的研究主要集中在TiN薄膜涂层的力学和化学性能方面。因此，本研究从涂层缺陷和涂层与基体的粘附性能的角度研究了CVD和PVD涂层的耐腐蚀性能等基本性能。研究了涂层功能降解过程中缺陷对涂层耐环境性能的影响。然后，研究了通过改善涂层与基体之间的粘附状态来改善涂层的这些特性。所得结果总结如下：(1)利用原子力显微镜（AFM）对镀TiN薄膜在3%NaCl水溶液中局部腐蚀的极初始阶段进行了详细的观察。结果表明，局部腐蚀形貌与缺陷类型之间存在一定的相关性。此外，还认识到缝隙腐蚀特性是由薄膜与基体之间的粘附特性控制的。(2)本研究使用的TiN薄膜涂层采用等离子体CVD和动态离子混合（DIM）两种不同的涂层方法制备。然后用原子力显微镜（AEM）观察了在3% NaCl水溶液中的缺陷形貌和局部腐蚀初期的形貌。结果表明，不同的涂层方法在缺陷类型和局部腐蚀形态上存在明显的差异。(3)电化学AFM可以在不同电化学控制条件下对不同镀膜方法制备的TiN薄膜进行缺陷类型和初始局部腐蚀过程的原位观察。