Development of Method to Form New-Function Thin Film by Fullerene Plasma
富勒烯等离子体形成新功能薄膜方法的开发
基本信息
- 批准号:09358008
- 负责人:
- 金额:$ 17.54万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (A)
- 财政年份:1997
- 资助国家:日本
- 起止时间:1997 至 1999
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The endohedral metallofullerene K@CィイD260ィエD2 was successfully formed by the energy and flux control of KィイD1+ィエD1 and CィイD1-ィエD1ィイD260ィエD2 ions flowing into substrates in experiments of the thin-film formation with a potassium-fullerene (KィイD1+ィエD1-CィイD1-ィエD1ィイD260ィエD2) plasma. Since the K@CィイD260ィエD2 production ratio to CィイD260ィエD2 was at most 30% and usually 5〜10% or less, however, it was difficult to clarify the relation between the plasma effect and encapsulation mechanism. From the above-mentioned viewpoint, the experiments were carried out by a sodium-fullerene (NaィイD1+ィエD1-CィイD1-ィエD1ィイD260ィエD2) plasma, where the diameter of NaィイD1+ィエD1 is smaller than that of KィイD1+ィエD1. The following results were obtained.According to the mass analysis of thin films formed on the substrates, the large mass-spectrum peak (Na(@)CィイD260ィエD2) corresponding to the Na-endohedral fullerene is observed. The average intensity ratio of Na(@)CィイD260ィエD2 to CィイD260ィエD2 is turned out to be 30〜50%. Moreover … More , the Na(@)CィイD260ィエD2 production ratio to CィイD260ィエD2 in a narrow region of the substrate attains to 200% or more.When the substrate bias is changed, the average spectrum-peak intensity of Na(@)CィイD260ィエD2 is found to give the maximum value at a specific voltage.The composition and structure of the thin film are directly investigated by the high-resolution electron microscope (HREM) observation. A lot of CィイD260ィエD2 molecules with dark shadows around the centers are observed over the image of the thin film in the narrow region of the substrate. The round material imaged by the HREM is considered to be CィイD260ィエD2 encapsulating Na inside the cage, because the NaィイD1+ィエD1 diameter almost corresponds to the dark shadow diameter.It can be said that a large amount of production of the Na-CィイD260ィエD2 compound materials containing Na@CィイD260ィエD2 facilitates the constituent analysis and structure observation for the purpose of clarifying their physical and chemical properties. This work is also important in the sense of establishing the method of forming fullerene-based thin films with new functions. Less
在钾-富勒烯(K - D1+ γ - D1-C - D1- γ - D1)等离子体薄膜形成实验中,通过控制K - D1+ γ - D1- γ - D1- γ - D1- γ - D1 γ - D260 γ - D2离子流入底物的能量和通量,成功形成了内质金属富勒烯K@C γ - D260 γ - D2。自从K@CィイD260ィエD2生产比CィイD260ィエD2最多30%,通常5 ~ 10%或更少,然而,很难澄清等离子体效应和封装机制之间的关系。基于上述观点,实验采用了钠富勒烯(Na′′D1+ γ′D1- c′′D1- γ′D1- γ′D1′D260′D2)等离子体,其中Na′D1+ γ′D1的直径小于K′D1+ γ′D1的直径。得到了以下结果:根据在衬底上形成的薄膜的质谱分析,观察到Na-内嵌富勒烯对应的大质谱峰(Na(@)C D260 D2)。结果表明,Na(@)C φ φ D260 φ φ D2与C φ φ D260 φ φ D2的平均强度比为30 ~ 50%。此外,在衬底的狭窄区域内,Na(@)C D260 D2与C D260 D2的生成比达到200%或更高。当衬底偏压改变时,发现在特定电压下Na(@)C的平均谱峰强度为最大值。利用高分辨率电子显微镜(HREM)直接观察了薄膜的组成和结构。在薄膜图像上,在衬底的狭窄区域内观察到大量的C _ (260) _ (260) _ (D2)分子,其中心周围有暗影。HREM成像的圆形材料被认为是C γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ γ。可以说,大量生产含有Na@C D260 D2的Na-C D260 D2复合材料,便于进行成分分析和结构观察,以阐明其理化性质。这项工作对于建立具有新功能的富勒烯基薄膜的形成方法也具有重要意义。少
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
HATAKEYAMA Rikizo: "Characteristics and Application of Fullerene Plasmas"J. Plasma and Fusion Res.. Vol. 75, No. 8. 927-933 (1999)
HATAKEYAMA Rikizo:“富勒烯等离子体的特性和应用”J。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
R.Hatakeyama: "High Yield Production of C_<74> Using an Arc-Discharge Plasma" Thin Solid Films. 316. 51-55 (1998)
R.Hatakeyama:“使用电弧放电等离子体高产生产 C_<74>”固体薄膜。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
SATO Noriyoshi: "Apptlation of Dusty Plasma : Fullerene Plasma"J. Plasma and Fusion Res.. Vol. 73, No. 11. 1252-1256 (1997)
佐藤则吉:“尘埃等离子体的应用:富勒烯等离子体”J。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
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T.Oku: "Structure of Carbon Nanocapsules with Ge and Si Formed by DC-RF Hybrid Arc-discarge"Proceedings of the 3rd International Nano Ceramic Forum and the 2nd International Symposium on Intermaterials. 207-209 (1999)
T.Oku:“DC-RF混合电弧放电形成的Ge和Si碳纳米胶囊的结构”第三届国际纳米陶瓷论坛和第二届国际材料研讨会论文集。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
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佐藤徳芳: "ダストプラズマの応用-フラーレンプラズマ-"Journal of Plasma and Fusion Research. 73・11. 1252-1256 (1997)
佐藤则吉:“尘埃等离子体的应用-富勒烯等离子体-”等离子体与聚变研究杂志73・11(1997)。
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- 影响因子:0
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HATAKEYAMA Rikizo其他文献
HATAKEYAMA Rikizo的其他文献
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{{ truncateString('HATAKEYAMA Rikizo', 18)}}的其他基金
Formation and application of non-equilibrium nanoscale plasma
非平衡纳米级等离子体的形成及应用
- 批准号:
24654186 - 财政年份:2012
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Challenging Exploratory Research
Foundation Establishment of Plasma-Exploited Nanocarbon Biotronics
等离子体利用纳米碳生物电子学的基础建立
- 批准号:
22244072 - 财政年份:2010
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Challenge to fabrication and functionalization of novel graphene by advanced plasma processing
通过先进等离子体处理制造和功能化新型石墨烯面临的挑战
- 批准号:
21654084 - 财政年份:2009
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Challenging Exploratory Research
Exploitation of Untrodden Field of Carbon-Based Nano-Bio Research Using Innovative Plasma Technology
利用创新等离子体技术开拓碳基纳米生物研究的未知领域
- 批准号:
18104011 - 财政年份:2006
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Scientific Research (S)
Development of the Creation Method of New Functional Evolved-Nanotubes by Using Plasma Ion Irradiation
等离子体离子辐照新型功能演化纳米管制备方法的发展
- 批准号:
13852016 - 财政年份:2001
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Scientific Research (S)
A New Aspect of the Origin of Plasma Turbulence Driven by Field-Aligned Velocity Shear
场对准速度剪切驱动的等离子体湍流起源的新方面
- 批准号:
11480104 - 财政年份:1999
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Scientific Research (B).
Formation of Plasma Structures Due to Local Production of Huge Negative Ions
由于局部产生大量负离子而形成等离子体结构
- 批准号:
09480088 - 财政年份:1997
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Plasma Potential Formation Due to Local ECR
局部 ECR 导致的血浆电势形成
- 批准号:
07458089 - 财政年份:1995
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Plasma Transport Induced by Cyclotron Resonance
回旋共振引起的等离子体传输
- 批准号:
03452280 - 财政年份:1991
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for General Scientific Research (B)