Subsurface Atomic Force Microscopy using Dual Probes

该提案旨在开发一种新的显微镜方法，用于对埋在样品表面下的纳米级结构进行成像;例如，计算机处理器芯片中的金属导体。预期的结果是一种新的方法，用于创建亚表面图像的应用程序集中在半导体器件的检测和质量控制。拟议中的显微镜预计将创造新的经济机会，包括新的商业产品，知识产权和创业的潜力。对澳大利亚的好处应该包括创造新的就业机会和发展高价值市场部门的本地专业知识。

The proposal aims to develop a new microscopy method for imaging nano-scale structures buried below the surface of a sample; for example, metal conductors in a computer processor chip. The expected outcome is a new method for creating subsurface images with an application focus on semiconductor device inspection and quality control. The proposed microscope is expected to create new economic opportunities including new commercial products, intellectual property, and the potential for a start-up venture. The benefits to Australia should include the creation of new job opportunities and the development of local expertise in a high-value market sector.