Flat panel X-ray source for Highly Portable 3D Planar X-ray Solution
Flat panel X-ray source for Highly Portable 3D Planar X-ray Solution
批准号:
101451
负责人:
金额:
$72.63万
依托单位:
依托单位国家:
英国
项目类别:
Collaborative R&D
财政年份:
2014
资助国家:
英国
项目状态:
已结题
起止时间:
2014 至 --
中文摘要
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英文摘要
The business opportunity presented by MAX is to introduce a radical technology to create a shift from vacuum tubes to crystal based sources that can be manufactured using existing semiconductor foundry processes. The MAX source enables a flat panel X-ray source that does not require an external high voltage supply, high voltage electronics or a vacuum tube. As a result the most costly, bulky, expensive and fragile components of an X-ray source are eliminated. The result will be as transformational in clinical, security and industrial applications as the introduction of flat panel LCD and Plasma screens have been in Visual Display Units. This project will deliver a full scale (40cm x 40cm) solid state source manufactured in a semiconductor development environment and tested on a phantom. This device will then be ready to transfer to a manufacturing environment, CE tested and released for commercial production.
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