Integrated Plasma Source Focused Ion Beam with Scanning Electron Microscope

集成等离子源聚焦离子束与扫描电子显微镜

• 批准号: EP/P001521/1
• 负责人: John F Watts
• 金额: $ 100.55万
• 依托单位: University of Surrey
• 依托单位国家: 英国
• 项目类别: Research Grant
• 财政年份: 2016
• 资助国家: 英国
• 起止时间: 2016 至 无数据
• 项目状态: 已结题
• 来源: https://gtr.ukri.org/projects?ref=EP%2FP001521%2F1
• 关键词: Integrated; Plasma; Source; Focused; Ion

This proposal seeks to establish a state-of-the-art plasma FIB at Surrey - only the second such instrument in the UK. The system will enable the removal of material in a controlled manner at the nanometre scale. This will enable the manufacture of nanostructures for a wide range of uses, from quantum devices to microscopic mechanical test pieces. The PFIB is equipped with scanning electron microscopy so that as material is removed in a controlled manner so a three dimensional image of the eroded area can be built up. This is tomography on the microscopic scale and enables one to image sub-surface features such as inclusions in a metal alloy, interpenetration of layers in a microelectronics device or corrosion around a second phase particle in a metal. Nanomachining is the other activity that a PFIB will perform well with samples of well defined geometry and/or thickness being produced with lengths varying from tens of nanometres (thickness of an electron transparent specimen) through to just under a millimetere. Once manufactured such specimens can be examined by transmission electron microscopy or a surface analysis technique such as secondary ion mass spectrometry. Thus this equipment bid will provide a new capability with far reaching impact across several themes and many sub-themes of the EPSRC portfolio significantly enhancing existing research both in Surrey and in collaborators across the UK as well as opening up new research possibilities. There are few single instruments currently available that can be applied to so many areas of scientific and engineering research. Materials research, one of the eight great technologies and a current government priority, is by far the most obvious benefactor but the manufacturing capability of the instrument will be applied to other nationally important areas such as experimental physics and metrology. This instrument will be very significant, its versatility and high efficiency has the potential to accelerate impact across many of these themes maintaining the United Kingdom's role as a leading science nation.

这项提案旨在建立一个国家的最先进的血浆FIB在萨里-只有第二个这样的仪器在英国。该系统将能够在纳米尺度上以受控的方式去除材料。这将使纳米结构的制造具有广泛的用途，从量子器件到微观机械测试件。PFIB配备了扫描电子显微镜，以便以受控的方式去除材料，从而可以建立侵蚀区域的三维图像。这是微观尺度上的层析成像，使人们能够对金属合金中的夹杂物、微电子器件中的层间渗透或金属中第二相颗粒周围的腐蚀等亚表面特征进行成像。纳米加工是PFIB将很好地执行的另一项活动，其具有良好定义的几何形状和/或厚度的样品，其长度从几十纳米（电子透明样品的厚度）到略低于一毫米不等。一旦制造，这样的标本可以通过透射电子显微镜或表面分析技术，如二次离子质谱检查。因此，该设备招标将提供一种新的能力，对EPSRC组合的几个主题和许多子主题产生深远的影响，显着增强萨里和英国各地合作者的现有研究，并开辟新的研究可能性。目前几乎没有单一仪器可以应用于如此多的科学和工程研究领域。材料研究是八大技术之一，也是当前政府的优先事项，是迄今为止最明显的受益者，但仪器的制造能力将应用于实验物理和计量等其他国家重要领域。这一工具将具有非常重要的意义，其多功能性和高效率有可能加快对许多这些主题的影响，保持联合王国作为一个领先的科学国家的作用。

项目成果

Stress-strain engineering of single-crystalline silicon membranes by ion implantation: Towards direct-gap group-IV semiconductors

• DOI: 10.1103/physrevmaterials.5.124603
• 发表时间: 2021-12
• 期刊: Physical Review Materials
• 影响因子: 3.4
• 作者: M. Masteghin;Vivian S. Tong;E. Schneider;Cameron C. L. Underwood;T. Peach;B. Murdin;R. Webb;S. Clowes;D. Cox

Uncertainties in focused ion beam characterisation

聚焦离子束表征的不确定性

• 发表时间: 2020
• 作者: Helen Jones

FIB-SEM Sectioning Study of Decarburization Products in the Microstructure of HVOF-Sprayed WC-Co Coatings

• DOI: 10.1007/s11666-018-0721-3
• 发表时间: 2018-05
• 期刊: Journal of Thermal Spray Technology
• 影响因子: 3.1
• 作者: Vasileios Katranidis;S. Gu;D. Cox;M. Whiting;S. Kamnis

Investigating the formation of isotopically pure layers for quantum computers using ion implantation and layer exchange

• DOI: 10.1016/j.nimb.2019.09.013
• 发表时间: 2019-12-15
• 期刊: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
• 影响因子: 1.3
• 作者: England, Jonathan;Cox, David;Perez-Fadon, Andres
• 通讯作者: Perez-Fadon, Andres

Investigation of Dayem Bridge NanoSQUIDs Made by Xe Focused Ion Beam

Xe聚焦离子束制造的达耶姆桥纳米SQUIDs的研究

• DOI: 10.1109/tasc.2018.2854624
• 发表时间: 2018
• 期刊: IEEE Transactions on Applied Superconductivity
• 影响因子: 1.8
• 作者: Godfrey T