X-RAY DIFFRACTION CAPABILITY FOR NANOSCALE AND THIN FILM STRUCTURE

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The specific arrangements of matter at the atomic scale gives advance functional materials their unique properties. Therefore, the future in materials design relies on our ability to control nanoscale structures. To achieve this, a vital tool for material scientist is x-ray diffraction as it allows in-depth characterisation of the crystal structure.Here we propose to establish an x-ray diffractometer dedicated to nanoscale and thin film structure with a set of capabilities which will enable material scientist to study the structural properties of polycrystalline and epitaxial films and probe the interface quality and structure which often dictates the performance and functionality of the nanoscale material. The high throughput capability offered by this equipment will play a vital role in atomic scale design of functional materials and process optimisation for integration in device. It will enable the routine measurement of phase purity, crystalline quality, thickness and roughness using non-destructive method. More advanced measurements will be used to determine epitaxial relationship and texture of the nanostructures. The materials studied have applications in renewable energy (photovoltaic, battery, thermoelectric), electronic (transparent conducting oxides, dielectrics, semiconductor alloys)