Ferroelectric, Ferroelastic and Multiferroic Domain Walls: a New Horizon in Nanoscale Functional Materials
Ferroelectric, Ferroelastic and Multiferroic Domain Walls: a New Horizon in Nanoscale Functional Materials
批准号:
EP/P02453X/1
负责人:
J M Gregg
金额:
$77.48万
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2017
资助国家:
英国
项目状态:
已结题
起止时间:
2017 至 --
中文摘要
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英文摘要
Some functional materials, such as ferroelectrics, contain membrane or sheet structures called "domain walls". For decades, domain walls were dismissed as being minor microstructural components of little significance. It is now clear that nothing could be further from the truth. Domain walls often, in fact, have unique functional properties that are completely different from the domains that they surround: they can be conductors or superconductors when the rest of the material is insulating; they can display magnetic order in non-magnetic crystals and they can possess aligned electrical dipoles when the matrix surrounding them is non-polar. In effect, domain walls represent a new class of sheet-like nanoscale functional material. Gaining a basic understanding of the behaviour of such a new family of sheet materials, which already shows a very wide gamut of properties, is certainly worthwhile, but domain walls offer so much more: uniquely, they are spatially mobile, can be controllably shunted from point to point, and can be spontaneously created, or made to disappear. This unique "now-you-see-it, now-you-don't" dynamic property could radically alter the way in which we think about the integration of functional materials into devices and the way in which device functionality is enabled: functionally active domain walls themselves could be introduced or removed as the primary mechanism in device operation. As a simple example, a new form of transistor could readily be envisaged where switching between the "ON" and "OFF" states is achieved through the injection and annihilation respectively of conducting domain wall channels connecting the source and drain electrodes. Multiple controlled domain wall injection events (resulting from sequential pulses in electrical bias between source and drain, for example) could create a series of different resistance states, depending on the number of conducting walls introduced. Thus a new kind of memristor device could be created. Possibilities for future domain wall-based applications are tantalising. However, relevant research is still at an early stage; a great deal needs to be done to establish the basic physics of the functional behavior of domain walls and strategies need to be developed to allow their reliable deployment with nanoscale precision. Only then can the potential for domain wall based devices be properly assessed.In this Critical Mass Grant, we seek to harness the collaborative effort of a number of world-class UK-based academic teams (in Cambridge, St. Andrews, Warwick and Belfast) to explore novel functionally active ferroelectric, ferroelastic and multiferroic domain walls. Together, we will: (i) Generate badly needed new and fundamental insight into the properties of known functionally active domain wall systems;(ii) Perform smart searches for new functionally active domain wall systems;(iii) Demonstrate simple electronic and thermal devices (transistors, memristors and smart heat transfer chips) in which domain wall properties are the key to device performance and hence assess the potential for wider domain wall-based applications.
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DOI:
10.1002/adfm.202000284
发表时间:
2020-03
期刊:
Advanced Functional Materials
影响因子:
19
作者:
[O. Bak;T. S. Holstad;Yueze Tan;Haidong Lu;D. Evans;K. Hunnestad;Bo Wang;J. McConville;P. Becker;L. Bohatý;I. Lukyanchuk;V. Vinokur;A. V. van Helvoort;J. Gregg;Long-qing Chen;D. Meier;A. Gruverman]
通讯作者:
O. Bak;T. S. Holstad;Yueze Tan;Haidong Lu;D. Evans;K. Hunnestad;Bo Wang;J. McConville;P. Becker;L. Bohatý;I. Lukyanchuk;V. Vinokur;A. V. van Helvoort;J. Gregg;Long-qing Chen;D. Meier;A. Gruverman
DOI:
10.1063/5.0007148
发表时间:
2020-05
期刊:
Applied Physics Letters
影响因子:
4
作者:
[Amit Kumar;J. Guy;Linxing Zhang;Jun Chen;J. Gregg;J. Scott]
通讯作者:
Amit Kumar;J. Guy;Linxing Zhang;Jun Chen;J. Gregg;J. Scott
Influence of charged walls and defects on DC resistivity and dielectric relaxation in Cu-Cl boracite
带电壁和缺陷对 Cu-Cl 方硼石直流电阻率和介电弛豫的影响
DOI:
10.48550/arxiv.2108.08582
发表时间:
2021
期刊:
影响因子:
--
作者:
[Cochard C]
通讯作者:
Cochard C
DOI:
10.1002/aelm.202101384
发表时间:
2022-03
期刊:
Advanced Electronic Materials
影响因子:
6.2
作者:
[J. R. Maguire;Hamza Waseem;R. G. McQuaid;Amit Kumar;J. Gregg;C. Cochard]
通讯作者:
J. R. Maguire;Hamza Waseem;R. G. McQuaid;Amit Kumar;J. Gregg;C. Cochard
Influence of charged walls and defects on DC resistivity and dielectric relaxations in Cu-Cl boracite
带电壁和缺陷对 Cu-Cl 方硼石直流电阻率和介电弛豫的影响
DOI:
10.1063/5.0067846
发表时间:
2021
期刊:
Applied Physics Letters
影响因子:
4
作者:
[Cochard C]
通讯作者:
Cochard C
共 6 条
Addressing Current Issues in Multiferroics
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批准号:EP/J017191/1
-
项目类别:Research Grant
-
资助金额:$44.99万
-
财政年份:2012
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负责人:J M Gregg
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依托单位:
Visiting Researcher Support for Prof Nagarajan Valanoor (University of New South Wales)
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批准号:EP/H04339X/1
-
项目类别:Research Grant
-
资助金额:$2.14万
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财政年份:2011
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负责人:J M Gregg
-
依托单位:
Critical Scaling of Domain Dynamics in Ferroelectric Nanoelements
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批准号:EP/H047093/1
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项目类别:Research Grant
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资助金额:$41.35万
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财政年份:2010
-
负责人:J M Gregg
-
依托单位:
Investigating the fabrication and dipole characteristics of complex ferroelectric nanoshapes
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批准号:EP/F004869/1
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项目类别:Research Grant
-
资助金额:$68.48万
-
财政年份:2008
-
负责人:J M Gregg
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依托单位:
海外基金