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Design, fabrication and characterisation of arrays of low-voltage, non-volatile, III-V memories

Design, fabrication and characterisation of arrays of low-voltage, non-volatile, III-V memories
低压非易失性 III-V 存储器阵列的设计、制造和表征
批准号:
1959804
负责人:
金额:
$0.0万
依托单位:
依托单位国家:
英国
项目类别:
Studentship
财政年份:
2017
资助国家:
英国
项目状态:
已结题
起止时间:
2017 至 --

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中文摘要
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英文摘要
Static random access memory (SRAM), dynamic random access memory (DRAM) and Flash have complementary characteristics that make them well suited to their specialised roles in cache, active memory and data storage, respectively. Nevertheless, the concept of a 'universal memory' that combines the best features of each, i.e. fast, low-voltage, cheap, non-volatile, non-destructive read and high endurance has been a long-standing aspiration of the industrial and academic research communities. This project will follow on from very recent work in which the operation of large-scale (10 micron feature size) non-volatile III-V memory cells with non-destructive read was demonstrated at room-temperature. The objective will be to assess the suitability of the memory cells for implementation in different architectures (e.g. NAND Flash, NOR Flash and RAM), and to design, fabricate and characterise small arrays (2 x 2 and 4 x 4) of large-scale (10 micron feature size) memory cells.
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Ni-20Cr合金梯度纳米结构的低温构筑及其腐蚀行为研究
  • 批准号:
    52301123
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    30.00万元
  • 批准年份:
    2023
  • 负责人:
    郭晓开
  • 依托单位: