Material and device characterisation in the volume manufacture of VCSELs

VCSEL 批量生产中的材料和器件表征

• 批准号: 2268794
• 金额: --
• 依托单位: CARDIFF UNIVERSITY
• 依托单位国家: 英国
• 项目类别: Studentship
• 财政年份: 2019
• 资助国家: 英国
• 起止时间: 2019 至 无数据
• 项目状态: 已结题
• 来源: https://gtr.ukri.org/projects?ref=studentship-2268794
• 关键词: Material; device; characterisation; volume; manufacture

The student will develop a simulation to predict the manufacturing performance and critical tolerances of epitaxial layer material including compositions, doping and layer thicknesses, using quantum mechanical and optical mode solvers, based on device performance and in-situ reactor characterisation and ex-situ characterisation of vertical cavity surface emitting lasers. The scientific challenges include optimising characterisation approaches and data handling as well as producing physical models to connect epitaxial structure and device function to maximise manufacturing tolerances and yield.This project will be in collaboration with IQE, the global leader in the design and manufacture of advanced semiconductor wafer products.

该学生将基于器件性能、原位反应堆表征和垂直腔面发射激光器的非原位表征，利用量子力学和光学模式求解器，开发一个模拟来预测外延层材料的制造性能和临界公差，包括成分、掺杂和层厚度。科学挑战包括优化表征方法和数据处理，以及创建物理模型来连接外延结构和器件功能，以最大限度地提高制造公差和良率。该项目将与全球领先的先进半导体晶圆产品设计和制造公司IQE合作。