High Throughput Synthesis of PbnNb2O5+n (1.5 = n = 3) Pyrochlore-Structured Tunable Thin Films: Funding for Proof of Concept

一种新的高通量方法将用于在PbnNb2O5+n体系中合成薄膜，使得n在1英寸的电极衬底上从1.5到3变化。利用能量和波长色散x射线微分析监测PbO/Nb2O5在衬底上的比值变化，并利用掠射角x射线衍射和拉曼光谱研究对称性的变化。电介质特性的筛选将在无线电频率下使用零场和偏置场的局部阻抗测量来进行，以便确定可调谐滤波器应用中具有最高优点的成分。将对优化的组合物进行有限的MW测量，以确定这些化合物是否具有足够的可调性和足够低的介电损耗，从而在微电子领域产生重大影响。

A new high throughput method will be used to synthesise thin films in the PbnNb2O5+n system such that n is varied from 1.5 to 3 across a 1 inch electroded substrate. Variation in the PbO/Nb2O5 ratio across the substrate will be monitored using energy and wavelength dispersive x-ray microanalysis and changes in symmetry will be investigated use glancing angle X-ray diffraction and Raman spectroscopy. Screening of the dielectric properties will be performed using local impedance measurements under zero and bias field at radio frequencies in order to determine compositions with the highest figure of merit for tunable filter applications. Limited MW measurements will be performed on optimised compositions to determine whether these compounds exhibit sufficient tunability and low enough dielectric loss to have a significant impact in the microelectronics community.