High Efficiency Silicon Detectors for Synchrotron XRF

描述（由申请人提供）： 我们将开发一种新的X射线光谱仪，基于新型高效硅X射线探测器;具有良好的能量分辨率和高计数率能力，适用于同步加速器X射线荧光（XRF）应用。在第一阶段，我们扩展了非常成功的硅漂移探测器设计，目前在薄0.3毫米厚的基板上制造，进入厚探测器（厚达1.5毫米）的领域。这种增加的厚度对于将探测器的X射线吸收能力从15 keV扩展到40 keV至关重要。同步加速器XRF技术正在成为生物、化学和材料分析的重要工具。第三代同步加速器，如高级光子源（APS），具有6-40 keV区域的光子通量亮度，允许使用微米及以下的探针尺寸进行有效的X射线荧光分析。所有这些束线都需要高计数率、良好能量分辨率的能量色散X射线探测器，其具有高达40 keV的有效吸收。与传统的硅和锗XRF探测器相比，新的更厚的漂移探测器将具有非低温冷却、良好的能量分辨率和数量级的计数率提高的优点，同时提供10 keV以上的效率显著提高。 第二阶段的工作将包括优化厚探测器原型，包括将面积从20 mm 2增加到50 mm 2;提高产量和工艺设计，以便转移到商业硅铸造厂。将对探测器的噪声、能量分辨率、效率和计数率能力进行评价，以响应5-60 keV范围内的X射线。最好的设备将被选择纳入一个三通道X射线光谱仪。光谱仪将在阿贡国家实验室高级光子源的硬X射线微探针应用中进行定制设计和评估，并与APS工作人员合作。这种高效率光谱仪的商业应用包括钢、材料、化学、地质和生物应用中的化学分析。

DESCRIPTION (provided by applicant): We will develop a new x-ray spectrometer, based on novel high efficiency silicon x-ray detectors; with good energy resolution and high count rate capability for synchrotron x-ray fluorescence (XRF) applications. In Phase I, we extended the very successful silicon drift detector design, currently fabricated on thin 0.3 mm thick substrates, into the realm of thick detectors (up to 1.5 mm thick). This added thickness is critical in extending the x-ray absorption capability of the detectors from 15 keV to 40 keV. Synchrotron XRF techniques are becoming essential tools for biological, chemical and materials analysis. Third generation synchrotrons, such as the Advanced Photon Source (APS), have photon flux brilliance in the 6-40 keV region that allow efficient x-ray fluorescence analysis with probe sizes of a micrometer and below. All of these beam-lines require high-count rate, good energy resolution energy dispersive x-ray detectors that have efficient absorption up to 40 keV. The new, thicker drift detectors will have the advantages of non-cryogenic cooling, good energy resolution, and an order of magnitude improvement in count rates compared with conventional silicon and germanium XRF detectors, while providing a significant increase in efficiency above 10 keV. The Phase II work will include the optimization of the thick detector prototypes including increase in area from 20 mm2 to 50 mm2; improve the yield and design of the process for transfer to a commercial silicon foundry. The detectors will be evaluated with respect to noise, energy resolution, and efficiency and count rate capability in response to x-rays in the 5-60 keV range. The best devices will be selected to be incorporated into a three-channel x-ray spectrometer. The spectrometer will be custom-designed and evaluated in a hard x-ray microprobe application at the Advanced Photon Source at Argonne National Laboratory, in collaboration with APS staff. The commercial applications for such high efficiency spectrometers include chemical analysis in steel, materials, chemical, geological and biological applications.