Phase field modeling of phase patterns and domain structures in functional nano-composite films

点击翻译按钮获取中文摘要

The purpose of the proposed research is to develop a set of computational models that can be used for the analysis and design of thin films with nano-composite self-assembling structures. The self-assembling nano-composite films are a new group of materials with unique properties. Different types of such films can have different special properties: some of them can be used as ultra hard coatings with a very high fracture resistance, while others can provide unique electrical or magnetic properties. There are systems wherein the interaction between the components with ferromagnetic and ferroelectric (a ferroelectric material can maintain electric polarization similarly to a ferromagnetic material maintaining magnetization) properties can produce effects that cannot be obtained in individual components, such as a magnetic response to an electric field or an electric response to a magnetic field. Thin films with different combinations of unique properties can be used in a wide range of different applications. The pattern formed by different components in the structure of a self-assembling nano-composite film is sensitive to elastic interactions between components and between the film and substrate. It is possible to control this pattern by controlling different factors affecting elastic interactions. The first goal of this research is to develop a computational model that can predict the conditions under which different types of patterns in the structure of nano-composites can be produced. The information about the pattern is important because different patterns will produce different properties. The second part of the research will address the problem of the relationship between the component pattern in a nano-composite and its electric and/or magnetic properties. Models of the domain structure will allow us to predict the difference between the functional behavior of different patterns. Together the developed computational models will allow us to predict the conditions under which thin films with the optimum properties can be produced.