High performance gas handling and injection system for ultrahigh vacuum tools

许多半导体工艺需要在真空室中以受控方式注入气体。由于半导体行业的性质，这些工艺必须提供高度统一和可重复性的产品，并取得高水平的成功。直到今天，围绕在真空中注入气体的技术仍然是粗糙的。虽然高度均匀的气体通量通常是在真空室中产生的，但注射器是极其浪费的，在这个过程中只使用了注入气体的几个百分点，其余的就被浪费了，产生了不必要的化学品、减排、处置和维护成本。随着发光二极管(LED)在固态照明和光伏电池和面板等领域的强劲扩张，使用真空气体注入的新工具市场保持了两位数的年增长率，分析师预测未来几年将持续增长。因此，市场对天然气管理和注入的新技术已经成熟，在控制、成本和天然气使用效率方面都有显著改进。

Many semiconductor processes require the injection of gases in a vacuum chamber in a controlled manner. Because of the nature of the semiconductor industry, these process must deliver highly uniform and reproducible products with a high level of success. To this day, the technology surrounding the injection of gas in vacuum remains crude. While highly uniform gas fluxes are routinely generated in the vacuum chambers, the injector are extremely wasteful, using merely a few percent of the injected gas in the process and sending the rest to waste, generating unwanted costs for chemicals, abatement, disposal and maintenance. With several application in strong expansion, such as light emitting diodes (LEDs) for solid-state lighting and photovoltaic cells and panels, the market for new tools using the injection of gas in vacuum has maintained double digit annual rate of growth and the analysts forecast a sustained growth in the coming years. The market is therefore ripe for a new technology of gas management and injection with significant improvements in control, costs, and gas usage efficiency.