Development and application of the low critical velocity cold spray process

低临界速度冷喷涂工艺的开发及应用

• 批准号: 445969-2012
• 负责人: Maev, Roman
• 金额: $ 6.92万
• 依托单位: University of Windsor
• 依托单位国家: 加拿大
• 项目类别: Collaborative Research and Development Grants
• 财政年份: 2015
• 资助国家: 加拿大
• 起止时间: 2015-01-01 至 2016-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=575096
• 关键词: Development; application; low; critical; velocity

The Low Pressure Cold Spray (LPCS) technology has proven its capability of in-situ material build-up from tens of microns to centimeters, varying the composition and characteristics of the formed coatings, and imparting to the deposited coatings such properties as high density, high conductivity and/or corrosion resistance. However, the low deposition rate is one of the main unresolved short comings of the LPCS process, substantially limiting its industrial usage. The low deposition rate is correlated with particle velocity, which is necessary for forming of dense coating. It has been well established that impacting particles must exceed a critical value of particle velocity, called - critical velocity, to deposit on instead of bouncing off the substrate. The magnitude of the critical velocity generally depends on several factors, including particle and substrate material properties, particle temperature and size, particle and substrate surface conditions, etc. Of special interest is the presence of an oxide layer on the particle surface and its ability to considerably affect the critical velocity. Developing a method to manage the critical velocity of the feedstock powder material is very important, because the lower the critical velocity, the higher the deposition rate of the accelerated powder particles. The project offers to resolve the low deposition rate problem by controllably decreasing the particle oxide film thickness, using plasma pre-treatment of feedstock metal powders. The overall objectives of the project are: (a) developing a Low Critical Velocity Spray process (LCVS) by using plasma pre-treated Al and Cu based feedstock powder compositions intended for EnWin Utilities, Ltd., applications and (b) implementing the developed LCVS process into a compact proof of concept prototype LPCS system, with an elevated deposition efficiency.

低压冷喷涂（LPCS）技术已经证明其能够原位形成从几十微米到厘米的材料，改变所形成涂层的成分和特性，并赋予沉积涂层高密度、高导电性和/或耐腐蚀性等特性。然而，低沉积速率是LPCS工艺尚未解决的主要缺点之一，大大限制了其工业应用。 低沉积速率与粒子速度有关，这是形成致密涂层所必需的。已经确定的是，撞击颗粒必须超过颗粒速度的临界值，称为临界速度，以存款在基底上，而不是从基底反弹。临界速度的大小通常取决于几个因素，包括颗粒和基底材料性质、颗粒温度和尺寸、颗粒和基底表面条件等。 它对临界速度的影响很大。开发一种方法来管理原料粉末材料的临界速度是非常重要的，因为临界速度越低，加速的粉末颗粒的沉积速率越高。该项目提供了解决低沉积速率的问题，通过可控地减少颗粒氧化物膜的厚度，使用原料金属粉末的等离子体预处理。 该项目的总体目标是：（a）通过使用等离子体预处理的Al和Cu基原料粉末组合物开发低临界速度喷涂工艺（LCVS），该工艺将用于EnWin Utilities，Ltd.，（B）将所开发的LCVS工艺实施到具有提高的沉积效率的紧凑的概念原型LPCS系统的验证中。