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Vacuum polyradical deposition (VPRD) techniques for specialty nanoelectronics

Vacuum polyradical deposition (VPRD) techniques for specialty nanoelectronics
用于特种纳米电子学的真空多自由基沉积 (VPRD) 技术
批准号:
506356-2017
负责人:
Fanchini, Giovanni
金额:
$17.52万
依托单位国家:
加拿大
项目类别:
Strategic Projects - Group
财政年份:
2018
资助国家:
加拿大
项目状态:
已结题
起止时间:
2018-01-01 至 2019-12-31

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中文摘要
翻译
加拿大的塑料和聚合物制造业需要振兴,而加拿大的信息和通信技术(ICT)制造业正在蓬勃发展。我们的“大”数据社会和信息通信技术的进步产生了对新的制造解决方案的持续需求,这些解决方案在厚度,简单性和成本方面的要求目前无法从硅电子产品中获得,而基于有机聚合物的“塑料”电子产品经常被认为是有前途的替代品。这就迫切需要开发先进的、环保的制造方法来生产电子级“塑料”材料。多自由基是一种聚合物,其中每个重复单元支持一个未配对的电子,是“闪存”存储器研究的前沿,这种数据存储单元能够在没有任何外部电源的情况下保留信息,但可无限次写入。该提案利用了Fanchini-Gilroy团队最近的创纪录成就,他们展示了一种新设计的多自由基,聚[1,5-二异丙基-3-(顺-5-降冰片烯**-外氧-2,3-二碳酰亚胺]-6-氧-甲醛](P6OV)的超薄闪存器件,并获得了专利,其活性层最薄(10纳米),比商业硅薄得多。为了利用这一惊人的发现,必须实现一个具有工业可扩展性的系统,该系统具有从有机多自由基中产生集成电子器件的潜力。Fanchini-Gilroy团队将与加拿大最大的电子真空聚合物沉积系统生产商Plasmionique合作,开发一种新型真空多自由基沉积(VPRD)反应器的原型,该反应器将由我们的工业合作伙伴商业化,实现无溶剂和环保的多自由基大规模生产,为加拿大带来巨大利益。* *闪存的原型将大量的内存组件集成到一个芯片也将证明* *新VPRD制造系统,将功能设备模式开发* *西方大学纳米加工技术设施 .**************************************************************************************************************************************
英文摘要
The Canadian plastics and polymer manufacturing sector is in need of a rejuvenation, while Canada's**information and communication technology (ICT) manufacturing is booming. Our 'big' data society and the**progress of ICT generate a continuous demand for new manufacturing solutions that, at the required levels of**thinness, simplicity, and costs, are not currently available from silicon electronics, and 'plastic' electronics**based on organic polymers have often been suggested as promising alternative. This has created a pressing**need for the development of advanced, environmentally-friendly manufacturing methods for the production of**electronic-grade 'plastic' materials. Polyradicals, polymers in which each repeated unit supports an unpaired**electron, are at the forefront of research in 'flash' memories, data storage units capable to retain information**without any external power source, but are writable an unlimited number of times. This proposal capitalizes on**the recent record achievement of the Fanchini-Gilroy team that has demonstrated and patented ultrathin flash**memory devices from a newly designed polyradical, poly[1,5-diisopropyl-3-(cis-5-norbornene**-exo-2,3-dicarboxiimide)-6-oxo-verdazyl] (P6OV), with the thinnest active layer (10 nm) ever obtained, much**thinner than their commercial silicon counterparts. To capitalize on this startling discovery, an industrially**scalable system with the potential to lead to integrated electronics from organic polyradicals must be**implemented. In partnership with Plasmionique, Canada's largest producer of vacuum polymer deposition**systems for electronics , the Fanchini-Gilroy team will develop the prototype of a new vacuum polyradical**deposition (VPRD) reactor that will be commercialized by our industrial partner, enabling solvent-free and**environmentally-friendly mass production of polyradicals, with strong benefits to Canada. A prototype of a**flash memory integrating a large number of memory components onto a single chip will also be demonstrated**with the new VPRD fabrication system, which will feature device patterning technology developed at the**Western University Nanofabrication Facility.**************************************************************************************************************************************
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Laboratory of semiconducting and photoactive "post-graphene" 2D materials, nanomaterials and nanocomposites
  • 批准号:
    RGPIN-2020-06669
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $2.99万
  • 财政年份:
    2022
  • 负责人:
    Fanchini, Giovanni
  • 依托单位:
Laboratory of semiconducting and photoactive "post-graphene" 2D materials, nanomaterials and nanocomposites
  • 批准号:
    RGPIN-2020-06669
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $2.99万
  • 财政年份:
    2021
  • 负责人:
    Fanchini, Giovanni
  • 依托单位:
Laboratory of semiconducting and photoactive "post-graphene" 2D materials, nanomaterials and nanocomposites
  • 批准号:
    RGPIN-2020-06669
  • 项目类别:
    Discovery Grants Program - Individual
  • 资助金额:
    $2.99万
  • 财政年份:
    2020
  • 负责人:
    Fanchini, Giovanni
  • 依托单位:
Vacuum polyradical deposition (VPRD) techniques for specialty nanoelectronics
  • 批准号:
    506356-2017
  • 项目类别:
    Strategic Projects - Group
  • 资助金额:
    $12.57万
  • 财政年份:
    2019
  • 负责人:
    Fanchini, Giovanni
  • 依托单位:
海外基金