基于InN-NiO的近红外激光器件制备及其机理研究

批准号:
61674052
项目类别:
面上项目
资助金额:
60.0 万元
负责人:
王辉
依托单位:
学科分类:
F0403.半导体光电子器件与集成
结题年份:
2020
批准年份:
2016
项目状态:
已结题
项目参与者:
杨传径、王静鸽、孙红章、周洋、马海祥
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中文摘要
随着InN窄直接带隙的发现及其物理特性的深入研究,InN近红外发光器件在光纤通信领域展现出诱人的前景和潜在的市场需求,很可能为光纤通信领域发展带来重大突破。然而,InN近红外发光器件少有报道,尤其是InN近红外激光发射未见报道。最近,我们在该方面研究上取得了一些新的进展,实现了InN器件的近红外电注入发光,然而发光效率并不理想。因此,提高器件发光效率、实现InN基器件近红外电致激光发射、弄清器件近红外激射机理等问题都有待于我们进一步研究。为此,我们创新地提出将NiO作为载流子注入层,同时设计几种带有量子阱、反射镜、电流限制窗口等新结构的InN-NiO组合激光器件,对载流子和光进行诱导和限制,进一步提高发光效率和增益,实现InN基器件的激光发射,并重点对其电致激射机理进行深入研究。如能取得突破,将使我国InN近红外激光器领域形成有核心专利的自主知识产权,具有重要的科学意义。
英文摘要
The discovery of narrow direct band gap and deep development of research on InN, has made the InN-based near-infrared (NIR) laser devices have attractive application prospects and potential market demands in the field of fibre communication. These devices may bring a breakthrough in the development of fibre communication. However, we have rarely seen literatures about the InN-based NIR LEDs, especially the InN-based NIR LDs have not been reported yet. Recently, we have made some fresh progresses in this aspect, successfully realizing the near-infrared electroluminescence of InN-based light emitting diodes. However, the luminous efficiency of the device is not ideal and it still needs further research on how to improve the luminous efficiency of the device, how to realize the near-infrared electrically-driven laser emission of InN-based devices and figure out the mechanisms of the NIR laser emission. Base on such observations, we come up with the idea innovatively of using NiO as the carrier injection layer. We propose several kinds of new structures based on InN-NiO structures with current-blocking layers or quantum-well layers or reflectors and so on to induce and limit the carriers and light-emissions for further improving the luminous efficiencies and gains of the devices and realizing the laser emission of InN-based devices. Then focus on the study about the electrically-driven laser emission mechanisms of these devices. And if some breakthroughs can be made, it will be of great scientific significance to get the core patent of independent intellectual property rights in the field of InN-based near-infrared laser devices.
随着InN窄直接带隙的发现及其物理特性的深入研究,InN近红外发光器件在光纤通信领域展现出诱人的前景和潜在的市场需求,很可能为光纤通信领域发展带来重大突破。然而,InN近红外发光器件少有报道。最近,我们在该方面研究上取得了一些新的进展,实现了InN器件的近红外电注入发光,然而发光效率并不理想。因此,提高器件发光效率、弄清器件近红外电致发光机理等问题都有待于我们进一步研究。针对上述问题,本项目在该方面研究上取得了一些新进展,我们创新地提出将NiO作为载流子注入层,同时设计几种带有量子阱、电流限制窗口等新结构的InN-NiO组合发光器件,对载流子和光进行诱导和限制,进一步提高发光效率,并重点对其电致发光机理进行了深入研究。这样的结果为设计制备带有可控谐振腔、有一定输出功率、进一步可实用化的NiO-InN组合激光器件,为光纤通讯领域中无污染、高性能InN近红外激光器件制备奠定了良好的基础。
期刊论文列表
专著列表
科研奖励列表
会议论文列表
专利列表
Effect of Sputtering Temperature on Structure and Optical Properties of NiO Films Fabricated by Magnetron Sputtering
溅射温度对磁控溅射NiO薄膜结构和光学性能的影响
DOI:10.1007/s11664-017-5453-5
发表时间:2017
期刊:JOURNAL OF ELECTRONIC MATERIALS
影响因子:2.1
作者:Wang Hui;Zhao Yang;Li Xinzhong;Zhen Zhiqiang;Li Hehe;Wang Jingge;Tang Miaomiao
通讯作者:Tang Miaomiao
Enhancement characteristics of laser-induced plasma confined by hemispherical cavities in different materials
不同材料半球腔约束激光诱导等离子体的增强特性
DOI:10.1007/s00340-019-7349-y
发表时间:2019-11
期刊:Applied Physics B: Lasers and Optics
影响因子:--
作者:Li Xiaolong;Wang Jingge;Li Hehe;Li Xinzhong;Tang Miaomiao;Zhang Liping;Wang Qi
通讯作者:Wang Qi
Influence of growth temperature on structure, optical and electrical properties of nickel oxide films by magnetron sputtering
生长温度对磁控溅射氧化镍薄膜结构、光学和电学性能的影响
DOI:10.1016/j.vacuum.2018.02.026
发表时间:2018-02
期刊:Vacuum
影响因子:4
作者:Zhao Yang;Wang Hui;Yang Fan;Zhen Zhiqiang;Li Xinzhong;Li Qiuze;Li Jingjie
通讯作者:Li Jingjie
Effect of Sputtering Power on the Structural and Optical Properties of Inn Nanodots on Al2O3 by Magnetron Sputtering
磁控溅射 Al2O3 上溅射功率对 Inn 纳米点结构和光学性能的影响
DOI:10.1590/1980-5373-mr-2019-0380
发表时间:2019
期刊:Materials Research-Ibero-american Journal of Materials
影响因子:1.7
作者:Zhang Ziming;Li Jingjie;Zhou Yijian;Fu Hongyuan;Zhang Zixu;Xiang Guojiao;Zhao Yang;Zhuang Shiwei;Yang Fan;Wang Hui
通讯作者:Wang Hui
Substrate temperature induced physical property variation of InxAl1-xN alloys prepared on Al2O3 by magnetron sputtering
Al2O3 磁控溅射制备 InxAl1-xN 合金基体温度引起的物理性能变化
DOI:10.1016/j.vacuum.2020.109512
发表时间:2020-09
期刊:Vacuum
影响因子:4
作者:Zhou Yijian;Peng Wenbo;Li Jingjie;Liu Yue;Zhu Xuefeng;Wei Jiaqing;Wang Hui;Zhao Yang
通讯作者:Zhao Yang
NiO-GaN组合激光器件的电致激光发射机理研究
- 批准号:11404097
- 项目类别:青年科学基金项目
- 资助金额:30.0万元
- 批准年份:2014
- 负责人:王辉
- 依托单位:
茶园土壤酸化过程的碳氮循环耦合机制研究
- 批准号:41201224
- 项目类别:青年科学基金项目
- 资助金额:25.0万元
- 批准年份:2012
- 负责人:王辉
- 依托单位:
基于NEI的下一代网络的状态认知和流量控制模型及算法研究
- 批准号:61070247
- 项目类别:面上项目
- 资助金额:35.0万元
- 批准年份:2010
- 负责人:王辉
- 依托单位:
国内基金
海外基金
