磁化容性耦合电负性等离子体的数值模拟研究

低气压下的容性耦合等离子体源广泛应用于刻蚀工艺等，但是随着微电子工业的飞速发展，传统的容性耦合等离子体源已经无法满足日益增长的工艺要求。为了优化等离子体性质，基于传统的容性耦合等离子体装置，引入外磁场可以显著提高等离子体密度，对改善等离子体性质起着非常重要的作用。本项目将建立二维的隐式粒子蒙特卡洛模型，研究磁化放电中电负性等离子体的性质，对不同气压、不同的气体比例等情况下的等离子体参数给出定量的分析。研究非均匀磁场对等离子体性质的影响，模拟和分析由E×B漂移运动和磁场梯度引起的漂移不稳定性，力图找出有效的方法抑制不稳定性带来的等离子体不均匀，为微电子工业和相关实验的稳定放电和优化设计提供有价值的参考。

Low pressure capacitively coupled plasmas have been widely used in the etching process. However, with the rapid development of the microelectronics industry, traditional capacitively coupled plasmas are unable to meet the growing process requirements. In order to optimize the plasma properties, based on the traditional capacitively coupled plasma device, the application of an external magnetic field can significantly increase the plasma density and play a very important role in improving the plasma properties. In this project, a two-dimensional implicit Particle-In-Cell/Monte Carlo model will be established to study the properties of electronegative plasmas in magnetized discharges and give the quantitative analysis of plasma parameters at different gas pressures and gas ratios. Besides, study the influence of non-uniform magnetic field on the properties of plasma, simulate and analyze the drift instability caused by E×B drift and magnetic field gradient. Try to find an effective method to suppress the plasma inhomogeneity caused by the drift instability, so as to provide a valuable reference for stable discharge and optimized design in the electronics industry and related experiments.