Sputtering System (Materials Research)

具有原位表征的多束溅射系统 用于制备薄膜的能力， 将获得超晶格。 有些问题 用这种装置研究的是;重要的基本过程， 薄膜生长，包括生长效应的研究 参数对薄膜结构和物理性能的影响 控制粗糙度对超晶格的影响 薄膜和超晶格的结构;各种 超导问题，包括尺寸研究和 临界磁场材料的发展;磁性， 特别是与磁各向异性，DC 磁化强度和铁磁共振;输运性质 在垂直和平行的方向和发展 研究了多层膜的光学性质， X射线范围。 这种类型的仪器是一个必须为任何 在这里学习。 首席调查员因其 薄膜和多层膜制备的研究 材料，而在阿贡国家实验室

A multisource sputtering system with in-situ characterization capabilities useful for the preparation of thin films and superlattices will be acquired. Some of the problems to be studied with this apparatus are; basic processes important in thin films growth including the study of the effect of growth parameters on the structure and physical properties of thin films and superlattices; effects of controlled roughness on the structure of thin films and superlattices; a variety of superconducting problems, including dimensional studies and development of ultrahigh critical field materials; magnetism, especially studies related to magnetic anisotropy, DC magnetization and ferromagnetic resonance; transport properties both in the perpendicular and parallel direction and development and study of the optical properties of multilayers in the soft x-ray range. This type of an instrument is a must for any of the studies here. The principal investigator is well known for his research in the preparation of thin films and multilayered materials while at Argonne National Laboratory