Inorganic Thin Film Membranes for High Temperature Gas Separation

通过CVD在Vycor玻璃上沉积一薄层二氧化硅 利用硅烷的氧化反应。 cvd反应 是高度孔隙扩散限制的，所以沉积只发生在 在毛孔的嘴。 沉积的深度可以通过以下方式控制： 调节温度和压力。 从文献数据来看， 在该反应的速率上，约1微米的膜 可以在300 ℃和0.5-5托压力下沉积。 的 氢和其它气体通过复合材料的扩散率 膜将被测量。 此外，几个平衡限制 以氢为产物的反应将在 由复合膜形成的管，以测试 反应器/分离器概念的可行性。 实验的成功可能会导致高产量的 温度气体分离膜和的可能性， 反应器-分离器组合

A thin layer of silica will be deposited on Vycor glass by CVD using the oxidation reaction of silane. The CVD reaction is highly pore-diffusion limited, so the deposition only occurs at the pore mouths. The depth of deposition can be controlled by adjusting the temperature and pressure. From the literature data on the rate of this reaction, a film of approximately 1 micron can be deposited at 300 C at 0.5-5 Torr pressure. The diffusivities of hydrogen and other gases through the composite membrane will be measured. Further, several equilibrium-limited reactions, in which hydrogen is a product, will be carried out in a tube formed by the composite membrane, in order to test the feasibility of the idea of reactor/separator. Success of the experiments could lead to the production of high temperature gas separation membranes and the possibility of a combined reactor-separator.