Engineering Research Equipment Grant: Phase Detection Microscopy of Electrode Surfaces

研制了位相检测干涉显微镜(PDIM)。该仪器使用光学相位测量干涉技术在较大的表面积上测量垂直高度，这是一种快速、非接触的光学技术，可以以约0.2 nm的分辨率实时成像表面拓扑的变化。时间分辨PDIM成像将用于三种不同的电化学实验：层状金属二卤化物半导体在表面缺陷处的优先阳极溶解；活化玻璃碳电极的原位表面形态；以及在多晶金属衬底上的氧化物生长。该仪器还具有潜在的应用于表面化学、微电子学和聚合物科学中的问题。

A phase-detection interferometric microscope (PDIM) is acquired. This instrument measures vertical heights over a modestly large surface area using the technique of optical phase-measurement interferometry, a fast, non-contact optical technique allowing real-time imaging of variations in surface topology with a resolution of about 0.2nm. Time-resolved PDIM imaging will be used in three different electrochemical experiments: preferential anodic dissolution of layered metal dichalcogenide semiconductors at surface defects; surface morphology of activated glassy carbon electrodes in situ; and oxide growth on polycrystalline metal substrates. The instrument also has potential application to problems in surface chemistry, microelectronics, and polymer science.