Engineering Research Equipment Grant: CVD Synthesis of Multilayer Ceramic Interfaces

资助康奈尔大学安装化学气相沉积（CVD）系统，用于多层、多相金属和陶瓷薄膜的生长。CVD系统将用于在几纳米尺度上制造A/B/A/B结构的多层薄膜，其中A和B是不同的材料。这些多层膜将被加入到纤维增强复合材料中，以控制剪切和拉伸性能，以及界面的高温耐腐蚀性。由碳（石墨或金刚石）、氧化铝、氧化锆、碳化硅、二氧化硅、铂和铬制成的薄膜将被合成。这些组件可用于构建与各种陶瓷纤维（碳、碳化硅、硼化钛或氧化铝）以及包括金属、金属间化合物和陶瓷在内的基体材料兼容的多层界面。CVD设备最终将用于制备单晶陶瓷材料薄膜，从氧化镍和氧化锆等简单材料开始，到合成多组分陶瓷单晶薄膜，如具有巨大电光系数和高Tc超导体的调谐铁电体。合成单晶陶瓷薄膜的能力将大大提高对陶瓷和金属-陶瓷界面结构的理解能力。

Funds are provided for Cornell University to install a Chemical- Vapor-Deposition (CVD) system for the growth of multilayer, multiphase metal and ceramic thin films. The CVD system will be used to fabricate multilayer films with an A/B/A/B architecture on the scale of a few nm, where A and B are different materials. These multilayer films will be incorporated into fiber reinforced composites in order to control the shear and the tensile properties, and the high temperature corrosion resistance of interfaces. Thin films from carbon (graphite or diamond), alumina, zirconia, silicon- carbide, silica, platinum and chromium will be synthesized. These components can be used to construct multilayer interfaces that are compatible with a variety of ceramic fibers (carbon, silicon carbide, titanium boride or alumina) and with matrix materials that include metals, intermetallics, and ceramics. The CVD facility ultimately will be utilized to prepare thin films of single crystal ceramic materials, beginning with such simple materials as nickel oxide and zirconia, and leading to the synthesis of single crystal films of multicomponent ceramics such as tuned ferroelectrics with giant electro-optic coefficients and high Tc superconductors. The ability to synthesize single crystal ceramic films will measurably enhance the capability to understand the structure of ceramic and metal- ceramic interfaces.